Microfabrication for glass substrates, optical films, and various high-performance films!
We would like to introduce our "Photo Etching" services. Using precision photographic technology, we offer integrated processing of fine precision photography on glass substrates, quartz, silicon, films, and wafer deposition films. We also accept fine processing of optical system films, including high-resolution films, and various high-performance optical films. Additionally, we process original plates and photomasks using laser direct drawing. Please feel free to contact us when you need our services. 【Lineup】 ■ Metal film photo etching (Cr, Cr2O3, Al, Au, Cu, Ni, and others) - Reticles, charts, scales, encoder slits, electrodes ■ Thin film photo etching - Lift-off, SiO2 diffraction gratings, ITO ■ Glass substrate etching - Observation slide glass, flow paths, diffusion plates (transmittance control available) *For more details, please refer to the PDF document or feel free to contact us.
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Our company has made significant contributions to the history of the optical industry with advanced optical system technology, precision photography technology, and microfabrication technology in the 20th-century camera industry. Entering the 21st century, applications have expanded from the visible light realm to ultraviolet, infrared, and terahertz, and our optical system technology is in demand and adopted across various fields such as medical, security, robotics, lighting, communications, and automotive. In the era of IoT, we also propose and provide development design and manufacturing of components and units tailored to our customers' needs in the expected optical sensing technology.
![[Must-See for Engineers!!] MEMS-related Photo Etching Technical Documentation Collection](https://image.mono.ipros.com/public/product/image/1fe/2000151167/IPROS4342770482048066255.JPG?w=280&h=280)
