High-quality oxide, nitride, and metal films can be deposited with a high film formation rate!
"KOBUS-F.A.S.T" is a solution that achieves high-quality thin film deposition processing, not only through the F.A.S.T process that balances the coverage of ALD and the deposition rate of PECVD but also enables ALD deposition. It is used for applications involving base layer SiO2, barrier layer TiO2, and metal layers Cu, Co, or transparent conductive ZnOx with ALD and F.A.S.T high-rate deposition while maintaining good coverage. This is recommended for engineers who are exploring methods to improve deposition speed while maintaining film quality and coverage in ALD deposition. 【Features】 ■ A process that balances the coverage of ALD and the deposition rate of PECVD ■ ALD deposition is also possible with this equipment ■ Capable of high-quality deposition of oxides, nitrides, and metals with high deposition rates *For more details, please feel free to contact us.
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basic information
【Other Features】 ■ Conformal SiO2 film deposition technology: Achieved approximately 65% conformality in via holes with an aspect ratio of 3.5:1 while maintaining breakdown voltage. ■ Conformal TiN film deposition technology: Achieved approximately 50% conformality in trench features with an aspect ratio of 12:1 while maintaining electrical resistivity. ■ Conformal Cu film deposition technology: Achieved approximately 95% conformality in via holes with an aspect ratio of 10:1 without compromising electrical conductivity. ■ Deposition of Co thin films with low electrical resistivity. ■ For optical device applications such as micro LEDs, deposition of ZnO-based transparent conductive films (TCO) with good transmittance, refractive index, and electrical conductivity. *For more details, please feel free to contact us.
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Applications/Examples of results
【Application】 ■ ALD of substrate layer SiO2, barrier layer TiO2, metal layers Cu・Co, and transparent conductive material ZnOx, along with F.A.S.T high-rate film formation that maintains good coverage. *For more details, please feel free to contact us.
Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
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