The tilt/rotation function of the wafer stage allows for feature setting!
"QuaZar" is a damage-free ion beam deposition solution that enables a precise thin film deposition application through a large-area ion source and advanced motion control. The extension of maintenance cycles, including the application of our uniquely developed Marathon-grids technology, is a crucial factor for production and can also be installed in your existing systems. The target is sputtered by an ion beam with the set energy, allowing for a wide process window. 【Features】 ■ REDEP breaker that prevents short circuits in the ion source using RF shunting ■ Auxiliary electrode system that prevents anode loss in the ion source ■ Adoption of a virtual shutter that eliminates the need for a mechanical shutter, reducing particles ■ Dual PBN (optional) that integrates two neutralizers *For more details, please feel free to contact us.
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basic information
【Other Features】 - The ion beam sputtering adopts a long throw method, enabling a low-pressure, highly directional sputtering process. - Up to 8 targets can be mounted. - The ion beam from the ion source is irradiated onto the target after passing through a focusing grid (using a 2MHz ICP ion source and a dish-type 3-grid ion optical system). - Ion energy ranges from 300eV to 1500eV with a maximum beam current of 420mA. - An inclination angle from 0 degrees to 90 degrees is possible for the target. *For more details, please feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Used for high-precision film formation of magnetic layers (NiFe, FeCo, CoFeB, Pd, Co) ■ Used for film formation of metal layers and dielectric layers for MTJ (MgO, Al2O3, Ru) ■ Used for film formation of metallization layers (TiW, Ti, Ta, W) ■ Used for film formation of high refractive index and low refractive index oxides (SiO2, Ta2O5, Nb2O5, TiO2) ■ Used for film formation of ultra-thin multilayer films for EUV mask blanks (Si, Mo, Ru) ■ Used for film formation of high-temperature bolometric and sub-stoichiometric films (Vox, TiOx) *For more details, please feel free to contact us.
Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for over 50 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
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