High-end sputtering process for optical films used in aerospace engineering and medical/bio applications is possible!
The "TFE BH/BV Batch Type Sputtering Series" offers a vertical transport method with extremely low particle deposition on substrates and a horizontal transport method with excellent maintenance capabilities. It achieves precise control of film thickness through high-speed scanning of substrates directly beneath each cathode, providing a sputtering solution for aerospace engineering and medical applications, all while maintaining an inline approach. Additionally, it allows for the selection of high-rate DC magnetrons for metals, RF magnetrons for oxides, and dual-cathode AC sputtering, enabling high-throughput production of high-end functional films. This is highly recommended for engineers seeking high-throughput film deposition using high-end batch equipment. 【Features】 ■ Good film thickness distribution through the swinging of the substrate holder (palette) ■ Cleaning process enabled by an RF etching chamber ■ Expandability of the sputtering process with DC substrate bias (optional) *For more details, please feel free to contact us.
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basic information
【Other Features】 ■ A vertical transport method that minimizes particle deposition on the substrate and a horizontal transport method that excels in maintenance are available. ■ By enabling substrate scanning at a maximum of 400 cpm with a completely parallel flat plate type, precise control of film thickness is achieved even in an inline configuration. ■ Capable of transporting not only wafers but also 20mm thick workpieces. ■ Options for high-rate DC magnetron for metals, RF magnetron for oxides, and dual-cathode AC sputtering are available. ■ RF sputter etching is possible within the chamber. ■ A bias application function for the substrate can be optionally installed. *For more details, please feel free to contact us.
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【Purpose】 ■ A production sputtering process that adopts a batch method, achieving high throughput and good film thickness distribution for optical multilayer films for anti-reflection and notch filters, as well as transparent conductive films for OLEDs. *For more details, please feel free to contact us.
Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
![[Example of Use] Sputtering Target Composite Material SiC/Si](https://image.mono.ipros.com/public/product/image/f42/2000180520/IPROS14162266355367390576.jpeg?w=280&h=280)
