Suitable for the film formation of nanomaterials (metal nanoparticles, nanowires, nanosheets, materials for nanoelectronics)!
The "TFE News Sputtering Series" is a research and development as well as small-scale production system with a variety of functions. It is a compact sputtering device capable of high-temperature film deposition of metal films and dielectric films for nanomaterials such as metal nanoparticles, nanowires, and nanosheets, with temperatures up to 800°C. Additionally, it offers the option of manual or automatic load lock, and features complete automatic control via PLC and PC, as well as remote control over the internet. This sputtering device is recommended for engineers seeking high substrate heating temperatures (maximum heating temperature: 800°C) for thin film deposition of nanomaterials. 【Features】 ■ Suitable for thin film deposition of nanomaterials (metal nanoparticles, nanowires, nanosheets, materials for nanoelectronics) ■ Capable of 800°C substrate heating, which is difficult with other devices ■ Cost-effective sputtering with substrate rotation *For more details, please feel free to contact us.
Inquire About This Product
basic information
【Other Features】 ■ Sputtering equipment for research and development and small-scale production ■ Maximum heating temperature: 800℃ ■ Cosputtering capability (substrate rotation possible) ■ Substrate size: Compatible with 2-inch to 8-inch (capable of transporting irregularly shaped workpieces mounted on a pallet) ■ Up to 4 cathodes (sputter up and sputter down) can be installed ■ Strong magnetic field cathodes for ferroelectric and ferromagnetic materials available ■ Manual and automatic load lock options available *For more details, please feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
【Applications】 ■ High-temperature film deposition for nanomaterials (metal nanoparticles, nanowires, nanosheets, etc. with fine structures of metals and dielectrics) ■ Optical thin film applications: deposition of low refractive index materials (SiO2) and high refractive index materials (Ta2O5, Nb2O5, TiO2) ■ Deposition of magnetic layers (NiFe, FeCo, CoFeB, Pd, Co) ■ Deposition of ultra-thin multilayer films for EUV mask blanks (Si, Mo, Ru) ■ Deposition of high-temperature bolometric and sub-stoichiometric films (VOx, TiOx) *For more details, please feel free to contact us.
Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
![[Example of Use] Sputtering Target Composite Material SiC/Si](https://image.mono.ipros.com/public/product/image/f42/2000180520/IPROS14162266355367390576.jpeg?w=280&h=280)
