Ion beam sputtering equipment for research and development as well as small-scale production!
The "TFE New Ion Beam Sputtering Series" is a research and development system for small-scale production with a variety of functions, particularly a sputtering solution for ferromagnetic films and solid electrolytes that allows for the formation of ferromagnetic thin films, such as MTJ devices, without plasma damage. Additionally, it is an ion beam sputtering device that achieves good film thickness distribution for solid fuel cell electrolytes. Furthermore, it is a sputtering device that offers the option of manual or automatic load lock, and features complete automatic control via PLC and PC, as well as remote control via the internet. 【Features】 ■ A plasma damage-free process applicable for the deposition of thin films for ferromagnetic elements (MTJ) ■ Excellent film thickness uniformity for solid fuel cell electrolytes (can be equipped with a glove box) ■ Outstanding film thickness uniformity (<2%: 3σ, 200mm wafer) *For more details, please feel free to contact us.
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【Other Features】 ■ Ion beam sputtering equipment for research and development and small-scale production ■ Enables plasma damage-free film formation of ferromagnetic elements ■ Excellent film thickness uniformity for solid oxide fuel cell electrolytes (＜2%: 3σ, 200mm) ■ Reactive ion beam sputtering with an ion source for ion assistance ■ Ion beam sputtering using up to four cathodes is possible *For more details, please feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Plasma damage-free sputtering process for the deposition of thin films for ferromagnetic elements (MTJ) and electrolytes for solid fuel cells (compatible with glove boxes) ■ Excellent film thickness uniformity (<2%: 3σ, 200mm wafers) ■ Extremely superior run-to-run reproducibility ■ Deposition of dense thin films with excellent surface smoothness ■ Capable of mounting up to four targets ■ Optical thin film applications: deposition of low refractive index materials (SiO2) and high refractive index materials (Ta2O5, Nb2O5, TiO2) *For more details, please feel free to contact us.
Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en