Replace hydrogen peroxide with ozone! Significantly reduce water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
Our semi-automatic device stands out for its high performance, efficient chemical recirculation, minimal installation area, and optimized space efficiency. 【Features】 - Reduces chemical costs by using ozone instead of hydrogen peroxide for conventional RCA cleaning. - No special specifications are required as it does not use high-concentration ozone water. - Integrates with other wet processes such as etching and resist stripping, allowing multiple processing steps to be carried out without moving the wafers. - Ozone decomposes easily, reducing waste disposal costs. - Installation area of less than 2m². - Capable of using chambers for 25 or 50 wafers. *For more details, please refer to the PDF document or feel free to contact us.
Inquire About This Product
Related Videos
basic information
【Products Offered】 ■BATCHSPRAY Clean Autoload ■BATCHSPRAY Acid Autoload ■BATCHSPRAY Solvent Autoload ■BATCHSPRAY Acid/Solvent Autoload ■BATCHSPRAY Acid/Clean Autoload ■BATCHSPRAY Acid ■BATCHSPRAY Solvent *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
catalog（2）
Download All Catalogs![[Product Catalog] Semi-Automatic Device "BATCHSPRAY Acid"](https://image.mono.ipros.com/public/catalog/image/01/652/756465/IPROS31302525282015061528.jpeg?w=120&h=170)
![[Company Information] Siconnex Japan LLC - A manufacturer of wet chemical equipment for the semiconductor industry.](https://image.mono.ipros.com/public/catalog/image/01/83c/737814/IPROS80497509584168115837.jpeg?w=120&h=170)
News about this product（1）
Company information
Siconnex, headquartered in Europe, is a global manufacturer of wet process equipment for the semiconductor industry and related fields. We provide batch spray equipment for wet etching, cleaning, and resist stripping for a wide range of end products, including MEMS, power semiconductors, analog/mixed-signal semiconductors, and III-V semiconductors. Our equipment sets industry standards with safety, automation, compact footprint, high throughput, and efficient use of economic resources. There is a growing demand for our solutions as follows: - Environmentally friendly: cleaning and resist stripping with ozone - Optimal for small quantities and diverse processes with a small footprint - Automatic detection of etching end points with EPD - Efficient equipment that reduces chemical consumption
![[Semiconductor/Class 100 Compatible] 100% Water-Free Air Nozzle](https://image.mono.ipros.com/public/product/image/2116982/IPROS15202438644694791694.png?w=280&h=280)
