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  4. Semiconductor Manufacturing Equipment
  5. Other semiconductor manufacturing equipment
  6. Chemical liquid scrub spin cleaning device

Chemical liquid scrub spin cleaning device

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last updated:Jun 16, 2025

株式会社ダン科学 入間営業所
株式会社ダン科学 入間営業所
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Complete various cleaning processes to spin drying in a single chamber. Space-saving design suitable for research and development as well as small lot production.

The "Chemical Liquid Scrub Spin Cleaning Device" is a cleaning machine that allows for various combinations of non-contact cleaning methods such as high-pressure spray, ultrasonic spray, and chemical liquids, as well as contact cleaning methods like brushes. It completes the cleaning process to spin drying within a single chamber, contributing to space-saving design that reduces installation space and costs. We can propose suitable device configurations based on various equipment configurations, chemical compositions, desired cleaning performance, and budget according to your needs. 【Features】 ■ Various cleaning methods and chemical liquids can be combined ■ Suitable for research and development applications and small to medium-sized sites ■ Ideal for sites developing and producing new materials such as SiC, GaN, and LT for small-diameter wafers and power semiconductors ■ Compatible wafer sizes: 3 inches to 6 inches (8 to 12 inches can also be accommodated upon separate consultation) *For more details, please refer to the materials. Feel free to contact us with any inquiries.

    Other semiconductor manufacturing equipment
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Chemical liquid scrub spin cleaning device

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  • Special site - Product/service details - https://pr.mono.ipros.com/xevios/product/

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【Examples of Use】 - Removal of foreign substances (organic and inorganic) - Removal of metal ions 【Cleaning Process】 - Surfactant and pure water scrub cleaning - Chemical solution spray - Megasonic spot shower - Spin drying 【Items to be Cleaned】 Various wafers - Si (Silicon) - Quartz - Oxides - Compounds, etc. *For more details, please refer to the materials. Feel free to contact us with any inquiries.

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■Various wafer cleaning

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Dual-sided scrub cleaning device (mass production compatible device)

Dual-sided scrub cleaning device (mass production compatible device)

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Pharmaceutical liquid scrub cleaning device (small-scale production compatible device)

Pharmaceutical liquid scrub cleaning device (small-scale production compatible device)

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Single-chamber scrub and spin cleaning device (multi-purpose scrub cleaning)

Single-chamber scrub and spin cleaning device (multi-purpose scrub cleaning)

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Company information

株式会社ダン科学

株式会社ダン科学 入間営業所

Industrial Machinery

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This brand name was chosen to signify the creation of highly unique products with the aim of "EXTENSIVE VISION ON SYSTEM." Current technological innovations are remarkable, and the demands of the times are constantly becoming more advanced. We believe that it is our mission at Zebios to contribute to the industry by consistently proposing differentiated equipment that will revolutionize the now-mature equipment industry.

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