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  6. SIMS Analysis | PCOR-SIMS (High-Precision Secondary Ion Mass Spectrometry)

SIMS Analysis | PCOR-SIMS (High-Precision Secondary Ion Mass Spectrometry)

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last updated:Jul 18, 2025

受託分析|ユーロフィンEAG
受託分析|ユーロフィンEAG
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Correction of sensitivity coefficients and sputtering rates across all depths in response to changes in the sample matrix, enabling high-precision depth profile analysis.

PCOR-SIMS (Point by point Corrected SIMS) is an analytical method uniquely developed by EAG Laboratories based on SIMS, leveraging years of experience and expertise. It corrects the sensitivity coefficients and sputtering rates for all points in the depth direction in response to changes in the sample matrix, enabling the acquisition of highly accurate depth profiles. PCOR-SIMS is effective for evaluating trace elements and compositions in compound semiconductors, as well as for assessing ultra-shallow ion implantation distributions of elements such as B, As, and P.

    Ion implantation equipmentContract AnalysisSecondary ion mass spectrometer
Thumbnail_PCOR-SIMS.jpg

SIMS Analysis | PCOR-SIMS (High-Precision Secondary Ion Mass Spectrometry)

Thumbnail_PCOR-SIMS.jpg
Thumbnail_PCOR-SIMS.jpg
  • Related Link - https://www.eurofins.co.jp/eag/services/enhanced-s…

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basic information

- Depth profile analysis of dopant concentration in compound semiconductors - Thickness analysis of epitaxial layers in compound semiconductors - Evaluation of ultra-low energy ion implantation distribution in Si substrates

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Applications/Examples of results

- Evaluation of the compound semiconductor AlGaAs (VCSEL LASER depth composition, impurity concentration analysis) - Analysis of the heterojunction bipolar transistor (HBT) - Evaluation of the ultra-shallow boron implantation distribution on Si substrate

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Analysis Case | Characterization of Ultra-Low Energy Boron Ion Implantation Samples After Thermal Treatment Using PCOR-SIMS

Analysis Case | Characterization of Ultra-Low Energy Boron Ion Implantation Samples After Thermal Treatment Using PCOR-SIMS

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Analysis Case | Measurement of Impurities in Silicon for Solar Cells

Analysis Case | Measurement of Impurities in Silicon for Solar Cells

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受託分析|ユーロフィンEAG

受託分析|ユーロフィンEAG

Testing, Analysis and Measurement

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If you are having trouble with material analysis, please feel free to consult EAG! ● High-quality analysis ● Short delivery time ● Quick response Eurofins EAG (abbreviated as EAG) has been providing material analysis services for over 40 years in the semiconductor industry, high-purity metals, and advanced/nano materials fields. We respond to customer needs with our long-standing technical expertise and quick delivery in SIMS analysis (Secondary Ion Mass Spectrometry), which is essential for process development, research and development, and quality assurance of semiconductor devices and manufacturing equipment, as well as TEM/STEM analysis (Transmission Electron Microscopy) and GDMS analysis (Glow Discharge Mass Spectrometry) used for impurity analysis of high-purity materials.

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Fine structure analysis | TEM/STEM (Transmission Electron Microscopy Analysis)
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