Lens Focus Scanner P-726 for Semiconductor Wafer Inspection

High-load compatible, high-precision Z-focus scanner supporting high throughput in wafer inspection.

In semiconductor wafer inspection, high-resolution Z-axis focus control and fast responsiveness are required to stably detect fine defects. Particularly in optical inspection systems using high NA objectives, focus accuracy and reproducibility are directly linked to the reliability of inspection results. The P-726 PIFOC high-load objective lens focus scanner achieves a Z stroke of up to 100 µm with sub-nanometer resolution in position control. Direct position feedback from a capacitive sensor and a flexure guide structure provide high linearity, repeatability, and long-term stability. Furthermore, its high-speed settling performance of approximately 6 ms contributes to the optimization of inspection processes involving Z-step movements. Due to its high-load design, stable operation is possible even when using high NA objectives or additional optical components. [Application Scenarios] - Z focus control in optical inspection of semiconductor wafer surfaces - Defect analysis equipment using high NA objectives - Three-dimensional inspection using confocal optical systems - Z scanning in laser and optical interference inspection devices [Benefits of Implementation] - Improved measurement stability through high-precision focus control - Reduced Z step time due to high-speed settling - Increased design flexibility of optical systems due to high-load capability

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