Semiconductor wafer cleaning equipment [Customizable for each item]
Single-wafer spin cleaning device, multi-tank wafer cleaning device, double-sided scrub cleaning device, chemical scrub cleaning device.
Compatible with 2 to 12-inch wafers. Customizable for each item.
Our company has extensive experience in wet process treatment across a wide range of fields, including semiconductors, MEMS, and compounds, and we provide optimal custom equipment tailored to user needs. We also accept design and manufacturing of various ancillary equipment, such as chemical supply systems. 【PR materials available for download】 ■ Batch-type spin cleaning equipment (suitable for mass production and small-scale production) ■ Multi-tank wafer cleaning equipment (suitable for mass production and small-scale production) ■ Double-sided scrub cleaning equipment (suitable for mass production and small-scale production) ■ Chemical scrub cleaning equipment (suitable for small-batch, diverse production) *For more details, please download the PDF or feel free to contact us.
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