Microfabrication is possible from small-scale prototypes. Photo-etching.
◎ Prototyping available from a single piece ◎ Consistent process from thin film formation ◎ Prototyping for dicing, bump formation, etc. also available ◎ Patterning of dielectric films and multilayer films possible with lift-off processing ◎ Substrate size can be customized ◎ Etching of Si wafers and glass substrates is also possible ◎ Short delivery times available (consultation required) ◎ Supports rigid and FPC substrates as well
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basic information
We accept small-scale prototypes using photolithography and precision photographic technology, which are essential technologies in MEMS and display devices. We form thin films on substrates such as glass substrates, Si wafers, films, and ceramics, and create fine patterns through consistent processing using photolithography. <Examples of Applications> - Various display device substrates (liquid crystal panels, PDP panels, organic EL panels, etc.) - Various wiring substrates (interposers, pitch adapters, multilayer wiring, COG substrates, etc.) - Fine pattern wiring on flexible substrates (polyimide materials) - Evaluation TEG substrates, development applications for various sensors, etc.
Price information
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Delivery Time
Applications/Examples of results
MEMS and nanotechnology related Other development and manufacturing of electronic and optical components or devices in general
Company information
In the future, as represented by MEMS, the research and development department will become indispensable in this industry, where higher precision and greater refinement are increasingly required. Our company will assist with prototyping and development using the know-how we have cultivated over many years. We look forward to inquiries from all industries, not just in the fields of electronics and optics.
![[Must-See for Engineers!!] MEMS-related Photo Etching Technical Documentation Collection](https://image.mono.ipros.com/public/product/image/1fe/2000151167/IPROS4342770482048066255.JPG?w=280&h=280)
