Microwave Radical Source EMRS-211Q
Quartz discharge tube type with external chamber magnetic field microwave-excited radical source 【Features】 ○ The plasma chamber is made of quartz glass, allowing visual confirmation of discharge. ○ Can be used with various ultra-high vacuum devices such as MBE systems due to its completely metal-sealed structure. ○ Ion acceleration is possible by using a high-voltage power supply for acceleration (optional) in addition to radical source applications. ○ Capable of introducing various active gases. ○ Microwaves are supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ● For other functions and details, please download the catalog.
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basic information
Quartz discharge tube type with external chamber magnetic field microwave excited radical source 【Features】 ○ The plasma chamber is made of quartz glass, allowing visual confirmation of discharge. ○ Can be used with various ultra-high vacuum devices such as MBE systems due to its completely metal-sealed structure. ○ Ion acceleration is possible by using a high-voltage power supply for acceleration (optional) in addition to its use as a radical source. ○ Capable of introducing various active gases. ○ Microwave is supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ● For other functions and details, please download the catalog.
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Applications/Examples of results
【Applications】 ○ Radical oxidation ○ Nitriding ○ Hydrogen reduction ○ Etching ○ Film formation assist
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Company information
In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.
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