Pursuing high quality, low price, and space-saving; a developer that supports both swing spray and paddle methods.
The multi-step program can save 99 steps × 50 patterns. Options such as liquid system expansion and liquid temperature control systems are also available. Please consult us for other sizes and custom specifications.
Inquire About This Product
basic information
A compact spin developer compatible with 6-inch wafers. In addition to spray development using a swing nozzle, paddle development is also possible. It is a semi-automatic developer that performs a continuous series of operations from development to rinsing to spin drying through program input.
Price information
We have prepared from 2.5 million yen.
Price range
P5
Delivery Time
Applications/Examples of results
It is used in the photolithography process of semiconductor, electronic component, and pharmaceutical manufacturers.
Company information
The company has a consistent production process from hardware and software development and design to manufacturing and sales, with its greatest feature being the development capability of various production equipment that integrates image processing technology and motion control technology.
![[Semiconductor/Class 100 Compatible] 100% Water-Free Air Nozzle](https://image.mono.ipros.com/public/product/image/2116982/IPROS15202438644694791694.png?w=280&h=280)
