List of Semiconductor Manufacturing Equipment products

  • classification:Semiconductor Manufacturing Equipment

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Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

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  • Other conveying machines

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Strong cold wind from room temperature to -13°C! Depending on the usage environment, you can choose between the combo type or the separate type!

  • Cooling system

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April 10, 2024 (Wednesday) to April 12, 2024 (Friday) Notice of Participation in Nagoya Manufacturing World 2024

Sanwa Shiki Ventilator Co., Ltd. will be exhibiting at the 2024 Monozukuri World (Nagoya) held at Port Messe Nagoya. We will also be showcasing our large cooling fans and cool/warm ambient products. Date: April 10, 2024 - April 12, 2024 Opening: 10:00 AM Location: Nagoya Port Messe (Exhibition Hall 1) *Our booth: 19-1 We would be grateful if you could visit us if you have the time.

Thorough removal of fine contaminants from wafers. High-quality cleaning achieved by Sonosys.

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  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Photomask

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For precise cleaning of prisms. Sonosys ultrasonic cleaning device.

  • 超音波洗浄装置(バス・タンク式).jpeg
  • Triple-nozzle-ecf5619c.jpg
  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Photomask

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Leave the latest ultrasonic cleaning to Sonosys.

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  • Triple-nozzle-ecf5619c.jpg
  • Photomask
  • CMP Equipment
  • CVD Equipment

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The website of the ultrasonic spray nozzle manufacturer "Sonaer" has been renewed.

The website of the ultrasonic spray nozzle manufacturer "Sonaer" has been renewed. Compared to the previous website, product browsing has improved, and we have also started offering a new system. If you are interested, please feel free to contact us.

Flow spray of 2 mmlit/min or less is possible!

  • nozzle
  • valve
  • Etching Equipment

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Notice of Discontinuation of Sales for Sonaer Particle Generators

We would like to inform you that we have received an important notification regarding product supply from Sonia Corporation, as detailed below. ■ Regarding Discontinued Products The following products will be discontinued for sale starting June 1, 2026: • 241TM • VM Module • 241CT • CST • CV • 2.4MHz Crystal This measure has been taken because it has become difficult to sell these products individually due to the soaring manufacturing and procurement costs of gold and fluoropolymer crystals. ■ Conditions for Continued Sales In the future, the 241TM, VM, and 2.4MHz Crystal will only be available for sale to customers who have previously purchased the 241PGT or 241PG. ■ Handling of New 241PGT The new 241PGT will only be provided as replacement parts. It will not be sold for new applications. If you have any questions or concerns regarding this matter, please feel free to contact us. We appreciate your continued support and look forward to serving you.

Atomization of liquid without pressurization by piezo vibration. Enables uniform application while reducing power consumption and liquid waste.

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  • spray
  • Coating Machine
  • CMP Equipment

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Our product catalog is now available on Apelza.

The catalog for the air nozzles manufactured by Lehira (commonly known as multi-channel jets), ultrasonic spray nozzles by Sonia, blowers, and air knife systems by Sonic has been released.

High-performance, cost-effective RF/DC magnetron sputtering device for research and development.

  • Other semiconductor manufacturing equipment
  • Sputtering Equipment

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Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!

Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

It excels in high sensitivity detection, quantification, and portability, making it suitable for quality inspection and research and development settings. It contributes to the detection of minute for...

  • Semiconductor inspection/test equipment
  • Other Sanitation Inspections
  • Other appearance and image inspection equipment

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Maintenance Resilience 2026: We will exhibit a fine particle visualization system at the 52nd Plant Maintenance Show. (July 15 (Wed) - July 17 (Fri), 2026 / Tokyo Big Sight, East Hall 1, 1-H12)

The particle visualization technology developed under our brand "ViEST" has a very high level of detection sensitivity that allows for real-time visualization of the suspended and adhered states of micro and nano-sized particles. We are engaged in the sale of visualization systems and contract services for evaluation (investigating particles and airflow in production processes, manufacturing equipment, and factory environments, evaluating the performance of cleaning products, proposing yield improvement measures, etc.) both domestically and internationally. In manufacturing environments, invisible fine foreign substances, dust generation, particle adhesion due to static electricity, and airflow disturbances can lead to quality defects and reduced yield. Our company clarifies these contamination factors through visualization technology and provides consistent support from identifying the source of the problem to considering and confirming improvement measures. Do you have any of the following concerns? - Unable to identify the cause of foreign matter contamination - Want to check airflow and cleanliness in clean rooms - Want to understand dust generation from manufacturing equipment and transport systems - Want to reduce particle adhesion to films and substrates - Want to improve contamination that causes yield reduction

Efficiently improving the common signal removal ratio of the EEG and system noise testing.

  • Tester

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