List of CVD Equipment products

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• Sensors

We can accommodate high resistance over 10,000 ohms, with diameters ranging from approximately 30 mm to 8 inches, and we also offer thinning and chip processing arrangements!

• Other semiconductors
• Processing Contract
• Wafer

Explaining the benefits of aerogel products that can be used in high-temperature environments!

• CVD Equipment

TiC treatment and TiCN treatment are possible! It can be used under harsher conditions than PVD treatment.

• CVD Equipment

Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on resin films and metal foils!

• CVD Equipment

Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on flat substrates such as glass and metal!

• CVD Equipment

With a space-saving design, the vacuum pump module can be installed up to 18 meters away from the process module.

• CVD Equipment

Demo available at our company! New technology launched in the market. CVD with atmospheric pressure plasma. Capable of handling small quantities and a variety of products.

• CVD Equipment
• Other painting machines
• Other processing machines

Silicon nitride, which has heat resistance and excellent thermal shock resistance, is a material with strong mechanical strength and good balance.

• Fine Ceramics
• CVD Equipment
• Heating device

The passivation MBE device is composed of various chambers specially designed for laser facet passivation and other purposes.

• Evaporation Equipment
• CVD Equipment

Eliminate concerns about vacuum piping equipment! Presenting examples of measures against degradation of centering due to plasma and heat.

• Other semiconductor manufacturing equipment
• valve
• CVD Equipment

Heat-resistant 150°C insulation material

• CVD Equipment

Equipped with a flow management system! Processing of powders at high temperatures using CVD/PECVD is possible.

• CVD Equipment

Various plasma sources can be equipped! Customized design for CVD, MOCVD, and ALD equipment.

• CVD Equipment

The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.

• CVD Equipment

Compatible with SI 500-1M, SI 500 PPD-1M, etc.! The transport chamber is available in three types.

• CVD Equipment