List of Heating device products

  • classification:Heating device

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For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.

  • TRON 1000.PNG
  • TRON 5000 black n white.JPG
  • TRON 5000.JPG
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  • Butyl Smooth.JPG
  • Work gloves

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Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.

Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.

This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.

  • Heating device

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.

  • CVD Equipment
  • Annealing furnace
  • Heating device

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Efficient direct heating through radiative heat transfer with wavelengths from 3μm to 1000μm.

  • Heating device

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Efficiently heats almost all substances except metals! Also for the drying process in semiconductor and liquid crystal panel manufacturing!

  • Heating device

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Adopts a titanium case with excellent corrosion resistance!

  • Heating device

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We support the drying of electronic devices and various types of printing and painting inks!

  • Heating device

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Cleanroom-compatible type! Made with special materials that do not generate dust, ensuring safety even in precision equipment manufacturing environments.

  • Heating device

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Ideal for drying processes of electronic devices such as semiconductors and LCD glass!

  • Heating device

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The power supply voltage is 100V/200V/220V/240V! It can be manufactured in various shapes such as convex and concave.

  • Other heaters
  • Heating device

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He supports various specifications of flanges! Can be manufactured according to applications, from small to large capacities.

  • Heating device

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High efficiency and clean heat source! Short delivery time from lamp design to prototype.

  • Heating device

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No need for temperature adjustment since the day before, improved yield even with thawing on the day!

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  • FRT-10 ドアー閉(S190073・沖縄食鶏加工).jpg
  • Heating device

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By using internal heating with radio waves, we achieve high-quality heating and drying without compromising the flavor of the breadcrumbs.

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  • Heating device

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Even poorly formed candies can be melted down without compromising quality. Achieve zero waste!

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  • Heating device

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High-frequency waves allow for the defrosting of food while still in cardboard. Add value with delivery after defrosting!

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  • FRT-60(ニチレイロジ東扇島).jpg
  • Heating device

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