List of Heating device products
- classification：Heating device
586～630 item / All 1943 items
Heat resistant up to 1200℃. We will custom-make high-performance insulation covers that ensure safety in the working environment!
- Glass
Maintaining press pressure, rapid cooling begins from 370℃! It is possible to manufacture various products.
- Heating device
- Cooling system
- others
It is a vacuum heating device for distillation, separation, concentration, and drying.
- Heating device
We have started a subscription that includes "induction heating equipment + after-service."
- Heating device
We have started a subscription for "after-service" for induction heating equipment for net sales.
- Heating device
Netsuren will periodically measure the cooling ability of the coolant (quenching liquid).
- Contract measurement
- Contract Analysis
- Heating device
Heat treatment technology that simultaneously achieves high strength and high precision.
- Engine parts
- Heating device
- Metal bearings
Supports heating and curing of resins and plastics! Inline compatible with the adoption of a network conveyor system.
- Heating device
Supports a maximum operating temperature of 280°C! Oven with an internal cleanliness class of 100.
- Heating device
Processing time and processing conditions can be easily changed using the touch panel!
- Heating device
A new steam convection oven that guarantees excellent uniformity even under maximum load!
- Heating device
We will widely accommodate the creation of a variety of steamed products!
- Heating device
New power module equipped with SiC MOSFET - EKOHEAT2
- Heating device
Strong in handling large items with well-equipped facilities such as large heat treatment furnaces and large shot blasting machines.
- Heating device
- Painting Machine
- Processing Contract
Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.
- Heating device
A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.
- Heating device
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
![[Nanofurnace] BWS-NANO Thermal CVD ...](https://image.mono.ipros.com/public/product/image/0d0/2000191194/IPROS99314670218218380543.jpeg?w=280&h=280){kind=small}
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Efficient direct heating through radiative heat transfer with wavelengths from 3μm to 1000μm.
- Heating device
Efficiently heats almost all substances except metals! Also for the drying process in semiconductor and liquid crystal panel manufacturing!
- Heating device
Adopts a titanium case with excellent corrosion resistance!
- Heating device
We support the drying of electronic devices and various types of printing and painting inks!
- Heating device
Cleanroom-compatible type! Made with special materials that do not generate dust, ensuring safety even in precision equipment manufacturing environments.
- Heating device
Ideal for drying processes of electronic devices such as semiconductors and LCD glass!
- Heating device
The power supply voltage is 100V/200V/220V/240V! It can be manufactured in various shapes such as convex and concave.
- Other heaters
- Heating device
He supports various specifications of flanges! Can be manufactured according to applications, from small to large capacities.
- Heating device
High efficiency and clean heat source! Short delivery time from lamp design to prototype.
- Heating device
![[Case Study] What are the results o...](https://image.mono.ipros.com/public/product/image/3f9/2000605712/IPROS10088947698618592946.jpeg?w=280&h=280){kind=small}
No need for temperature adjustment since the day before, improved yield even with thawing on the day!
- Heating device
![[Heating Example] How is the heatin...](https://image.mono.ipros.com/public/product/image/64b/2000624144/IPROS54845729874797877279.jpeg?w=280&h=280){kind=small}
By using internal heating with radio waves, we achieve high-quality heating and drying without compromising the flavor of the breadcrumbs.
- Heating device
![[Case Study] You can melt candies a...](https://image.mono.ipros.com/public/product/image/d3f/2000605714/IPROS55231550774228731234.jpeg?w=280&h=280){kind=small}
Even poorly formed candies can be melted down without compromising quality. Achieve zero waste!
- Heating device
![[Case Study] What is a defrosting d...](https://image.mono.ipros.com/public/product/image/e26/2000605715/IPROS64840494604985502791.jpeg?w=280&h=280){kind=small}
High-frequency waves allow for the defrosting of food while still in cardboard. Add value with delivery after defrosting!
- Heating device
![[Case Study] Can frozen fish be tha...](https://image.mono.ipros.com/public/product/image/d52/2000605717/IPROS62465583042188273581.jpeg?w=280&h=280){kind=small}
By introducing a high-frequency thawing device, we can achieve a reduction in the processes of "breaking down raw materials and loosening in running water"! Here are examples of frozen raw materials (...
- Heating device
![[Heating Device] Secondary steriliz...](https://image.mono.ipros.com/public/product/image/b1f/2000603428/IPROS00291506596891138127.jpeg?w=280&h=280){kind=small}
A compact and time-efficient sterilization device. It contributes to food waste reduction.
- Heating device
![[Defrosting Device] High-Frequency ...](https://image.mono.ipros.com/public/product/image/676/37438001/IPROS01307346816784414808.png?w=280&h=280){kind=small}
Quality preservation of frozen food ingredients! Continuous and high-speed processing of large quantities of frozen products. Automation of the entire process from thawing to processing has been achie...
- Heating device
A heating device that is compact and heats quickly.
- Heating device
![[Drying Example] Are there drying a...](https://image.mono.ipros.com/public/product/image/fc8/2000605036/IPROS46076670522744260421.jpeg?w=280&h=280){kind=small}
A drying device that is compact and dries in a short time. It does not compromise flavor or quality after drying.
- Heating device
Mixing under vacuum, pumping, and temperature control all in one machine! It can be used for applications such as heated mixing, vacuum degassing, and heating. If you use a mantle heater, it can be ut...
- Heating device
Just stick it on for fire prevention! A new type of fire extinguisher that can effectively extinguish fires while saving space!
- Heating device
A small-diameter heat gun that is easy to use for substrate work and heat shrink work.
- Heating device
Just stick it on for fire prevention! A new type of fire extinguisher that can effectively extinguish fires while saving space!
- Heating device
The design of the bottom of the furnace with a thin steel plate allows for easy loading and unloading of the cart. 【Drying furnace, industrial furnace, annealing furnace, industrial drying furnace】
- Heating device
Compact body and excellent drying power! Conveyor-type drying furnace suitable for various printing drying applications [Drying furnace, industrial furnace, annealing furnace, industrial drying furnac...
- Heating device
We will select a suitable heat source from the heating tests of the work and propose the equipment!
- Heating device