Atomic Layer Deposition (ALD) device
A very compact atomic layer deposition device with a rich process recipe.
Compact tabletop ALD. It can be used for various device development such as surface protection and modification by film formation on semiconductor devices, organic solar cells, nanowires, quantum dots, and more. The process has been developed at a material development base for ALD and CVD. We are continuously increasing the recipes and also accept new process development requests.
- Company:ALDジャパン
- Price:10 million yen-50 million yen