Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
This is a flexible R&D thin film experimental device that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and it can also be equipped with a substrate heating stage for annealing and plasma etching. A glove box storage type is also available (*specifications to be discussed). We offer a wide range of optional components that can be flexibly customized.
◉ Maximum substrate size: Φ6 inch
◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources)
◉ Organic evaporation source: 1cc or 5cc
◉ Φ2 inch magnetron cathode (up to 3 sources)
◉ Dry etching
◉ Glove box compatible (optional, specifications to be discussed)
◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holder, substrate rotation/lifting, substrate heating, and many other options available.
*Please first contact us with your required specifications, and we will configure the system to meet your needs.
