Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.
31～45 item / All 51 items
Fully automatic, compatible with a maximum of 200mm.
By docking our mask aligner module with the full-area exposure method, it can be used as the Ring Graphy Cluster LithoFab200.
Development process after exposure of wiring patterns! Introduction of development equipment powered by AC 200V/220V, 50Hz/60Hz.
We would like to introduce our "Developing Equipment." This equipment is capable of developing after the exposure of wiring patterns. The processing surfaces can be single-sided or double-sided. The equipment configuration includes unwinding, developing, rinsing, liquid removal, drying, and winding. 【Specifications】 ■ Lane configuration: 2 Lanes ■ Transport speed: 2.0 m/min ■ Material width: 35mm to 160mm for TAB/CSP/COF (250mm to 300mm for FPC) ■ Material thickness: PI 25μm and above ■ Processing surface: Single-sided and double-sided *For more details, please refer to the PDF document or feel free to contact us.
Supports everything from single-sided substrates to flexible substrates using Roll to Roll! No resist fall-off occurs.
Introducing the developing equipment for pattern formation handled by Fujikiko Co., Ltd. Compatible with both sheet substrates and flexible substrates using Roll to Roll. Thanks to the spray application, there is no scum left behind, and the well-designed horizontal transport conveyor prevents resist collapse. 【Features】 ■ Compatible with both sheet substrates and flexible substrates using Roll to Roll ■ No scum left behind due to spray application ■ Well-designed horizontal transport conveyor ■ No resist collapse occurs *For more details, please refer to the PDF materials or feel free to contact us.
Manual spin coater and manual spin developer that meet a wide range of needs from research and development to production.
The Riso Spin Cup Series adopts a spin unit equivalent to automatic coating/developing equipment while being manual, and it comes standard with features such as auto dispensers, various rinses, automatic waste liquid recovery, and cup exhaust. It allows for easy and safe high-precision resist processing. Additionally, we offer various options such as primary dispensers, chemical temperature control, fan filter units, and temperature/humidity controllers, enabling advanced coating and developing processes. At Risotech Japan, we design and manufacture equipment tailored to the coating chemicals (resist, polyimide, insulating films, etc.) and wafer sizes and applications used by our customers, providing sophisticated equipment.
Spin coating device
The process from developing the resist film applied on the glass substrate while rotating it to rinsing with pure water is performed automatically. 【Features】 ● A developing solution purge mechanism is provided, making it easy to change the type of developing solution. ● A robot is used for the left-right movement of the nozzle. The nozzle movement can be set arbitrarily over a wide range of 0 to 400 mm. ● The vertical position of the nozzle can be set arbitrarily over a wide range of 0 to 500 mm. *For details, please request the materials.
It is a compact automatic transport-type developing device.
The automatic conveyance development device "ACT-300A2S" is a machine that performs spray development while rotating substrates up to 6 inches in size. It is equipped with two systems for developing solution, one system for rinsing, and an air knife, allowing recipe settings to be operated via a touch panel, enabling automatic development processing of up to 25 pieces. *There is also a sheet-type model available without automatic processing. 【Main Specifications】 ○ Processing Capacity: Capable of continuous processing of up to 25 round substrates of 6 inches ○ Process: Developing solution: 2 systems, Rinsing: 1 system, Air knife: 1 system ○ Chemicals Used: Alkaline developing solution, deionized cleaning water For more details, please contact us or download the catalog.
For anything related to etching machine production, Kimura Etching.
We design and manufacture various wet processing equipment (etching, developing, stripping, cleaning, etc.) for applications ranging from research and development experimental devices to production equipment. The main material for the equipment body is PVC, but we also manufacture using PP, PVDF, and SUS depending on the chemicals and temperatures used. All of our equipment is custom-made to meet the specific requirements of our customers. We also undertake on-site work such as equipment modifications and relocations.
Excellent durability, high quality and performance! We meet our customers' strict demands for quality.
"NOVA" is an automatic developing machine developed for non-destructive testing as part of the AGFA NDT film system. This compactly designed product is environmentally friendly, highly durable, and equipped with high quality and performance. We meet our customers' strict demands for quality. 【Features】 ■ Top-level cost performance ■ Equipped with an infrared drying system for consistent results ■ Compact size and lightweight ■ Easy operation suitable for everyone ■ Simple structure for easy maintenance *For more details, please refer to the PDF document or feel free to contact us.
[Non-destructive Testing - RT] Stable quality achieved through the use of large tanks! Increased water volume in the washing system.
The "FNDX5 HS" is a medium-sized industrial X-ray film processor that can process from development to drying in 8 minutes. By increasing the water volume in the washing system and adding a heater in the washing tank, the film's preservation quality has been improved. Additionally, it is now possible to install an auto-loader that significantly shortens processing time. Please feel free to contact us if you have any requests. 【Features】 ■ Standby mode ■ Oxidation prevention function ■ Comprehensive maintenance system ■ Improved film preservation ■ Auto-loader installation available *For more details, please refer to the PDF document or feel free to contact us.
By adopting large tanks, we achieve stable film stability in non-destructive testing and radiographic testing!
The "FNDX 9A" is a large industrial X-ray film automatic developer that can process from development to drying in 10 minutes. It inherits the high quality and processing stability of the large automatic developer FIP7000. Power consumption is reduced during standby mode when not processing film. Additionally, during standby mode, an oxidation prevention cycle is initiated, eliminating the effects of oxidation. 【Features】 ■ Processing stability ■ Energy efficiency ■ Oxidation prevention function ■ Auto loader/Auto mixer (optional) ■ Comprehensive maintenance system *For more details, please refer to the PDF document or feel free to contact us.
The unique control system enables the reproducibility of patterns.
The "Emulsion Glass Automatic Developing Machine EL-GP" is an automatic developing device for glass masks, equipped with a transport robot that moves emulsion masks between six processing tanks and the loader/unloader, as well as an automatic liquid replenishment system. Processing conditions can be set using a touch panel. The loader can hold five (standard) emulsion masks. Once set in the loader, it automatically processes continuously. 【Features】 - Achieves uniformity in developing processing across the surface through a unique processing control system. - Ensures stable processing reproducibility by adopting a multi-mode liquid replenishment system. - Ultra-compact design allows installation in small-sized clean rooms. - Significantly improves workflow by being adjacent to the drawing machine. - Reduces waste liquid volume through liquid conservation, making it environmentally friendly. For more details, please refer to the catalog or feel free to contact us.
We would like to introduce an automatic developing machine for PCB films that accommodates processing widths from 56cm to 110cm.
The "NG Model / NGs Model" automatic developing machine for PCB film, manufactured by Colenta and handled by Rat Corporation, is a newly developed automatic developing machine for PCB film. A PRE washing tank is installed between each tank, maintaining a consistently clean state and eliminating liquid carryover between tanks. If a reduction in developing time or an increase in developing capacity is needed, you can easily upgrade by replacing the NG version rack with a deeper NGs rack. There are two types of models available: NG and the more capable NGs. **Features** - Equipped with filters for developing and fixing - Filter replacement warning sensor - Six sensors automatically calculate the film area and execute appropriate liquid replenishment *For more details, please refer to the catalog or feel free to contact us.*
Complete automation of development/etching! Ensures consistent production of high-quality products.
We handle the "Chrome Mask Automatic Developer" developed by Corenta Co., Ltd. This product processes pre-exposed chrome masks loaded onto a "hanger" while minimizing operator involvement in each step: resist development, rinsing, chrome etching, rinsing, resist stripping, cleaning, and drying. We offer two models equipped with a circulation and filtration system that includes appropriate chemical treatment (replenishment, antioxidant program) as standard. [Product Lineup] ■ GP1/6T ■ GP9/6T *For more details, please refer to the PDF document or feel free to contact us.
![Industrial film automatic developing machine INDX [43/55・43/5MW]](https://image.mono.ipros.com/public/product/image/3f0/2000728649/IPROS77451934143553488695.png?w=280&h=280)
Added water-saving features to the water supply line! Reduced the amount of chemicals with the structure of the tank and rack!
This product is an industrial film automatic developing machine designed with a focus on the environment, achieving compactness and space-saving, while reducing chemical usage and power consumption. It allows for combinations of 9 channels, including speed control, developing temperature, fixing temperature, and replenishment amount. The current processing status is displayed, and depending on the developing liquid temperature, the processing time can be adjusted from 3 to 17 minutes for "43/55" and from 2 to 12 minutes for "43/5MW." 【Features】 - Compact, space-saving design - Fully automatic control via electronic control - Reduced tank capacity - Structure durable for long-term use - Stable processing quality - Accurate replenishment for processed film *For more details, please refer to the PDF document or feel free to contact us.
We manufacture "development equipment" that uses liquids, such as semiconductors, LCDs, and plating processes, with a flexible production system that accommodates both custom and mass production! We bring those needs to life!
Ohtomo Manufacturing Co., Ltd. has been providing numerous products since its establishment in 1945. All the technologies and know-how honed over this long history are utilized in our current manufacturing, which always aims for the highest quality. Ohtomo's quality satisfies our customers at every process, from design and development to manufacturing and aftercare. We will continue to realize and provide our customers' needs with maximum creativity and effort. 【Business Content】 ○ Development and manufacturing of various film automatic developing machines and custom equipment For more details, please contact us or download the catalog.
