Last Updated： Aggregation Period:Jul 30, 2025～Aug 26, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Jul 30, 2025～Aug 26, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Jul 30, 2025～Aug 26, 2025
This ranking is based on the number of page views on our site.
31～45 item / All 51 items
Pursuing high quality, low price, and space-saving; a developer that supports both swing spray and paddle methods.
The multi-step program can save 99 steps × 50 patterns. Options such as liquid system expansion and liquid temperature control systems are also available. Please consult us for other sizes and custom specifications.
Small developing device for photolithography
Swing nozzle type spray development and paddle development compatible device 【Features】 - High performance, low price, compact tabletop type - Work size Φ1" to Φ6" - Easy operation with program input via LCD touch panel - Built-in dual liquid pressure delivery pumps ◆ For detailed specifications, refer to the catalog ◆
Device dimensions: 1700W × 1300D × 1400H
Set the substrate manually in the chuck, then perform paddle development, rinsing, and spin drying. A canister can be stored on the side of the main unit.
Fully automatic screen printing developing machine
As a manufacturer of screen printing machines, we have created screen plate processing equipment that embodies our commitment and experience in screen plates. Traditionally, the development process of screen plates after exposure has been done manually using spray guns and other tools. However, due to the recent refinement of printing patterns and the increase in screen plate sizes, meeting the required quality for plate making has become increasingly difficult. That’s why we recommend the Mino Screen Processor 2! This is a renewed version of the popular Mino Screen Processor, now equipped with more user-friendly specifications. Its uniform and powerful cleaning capability, unique to fully automatic operation, ensures high plate making accuracy. Additionally, it comes standard with a backlight, making it easy to check for any gaps in the plate. The standard-equipped sash door prevents cleaning noise and leakage of developing water, ensuring a comfortable working environment. By recycling the developing water, it also helps reduce costs and lessen the environmental impact.
Fully automatic, compatible with a maximum of 200mm.
By docking our mask aligner module with the full-area exposure method, it can be used as the Ring Graphy Cluster LithoFab200.
Development process after exposure of wiring patterns! Introduction of development equipment powered by AC 200V/220V, 50Hz/60Hz.
We would like to introduce our "Developing Equipment." This equipment is capable of developing after the exposure of wiring patterns. The processing surfaces can be single-sided or double-sided. The equipment configuration includes unwinding, developing, rinsing, liquid removal, drying, and winding. 【Specifications】 ■ Lane configuration: 2 Lanes ■ Transport speed: 2.0 m/min ■ Material width: 35mm to 160mm for TAB/CSP/COF (250mm to 300mm for FPC) ■ Material thickness: PI 25μm and above ■ Processing surface: Single-sided and double-sided *For more details, please refer to the PDF document or feel free to contact us.
Supports everything from single-sided substrates to flexible substrates using Roll to Roll! No resist fall-off occurs.
Introducing the developing equipment for pattern formation handled by Fujikiko Co., Ltd. Compatible with both sheet substrates and flexible substrates using Roll to Roll. Thanks to the spray application, there is no scum left behind, and the well-designed horizontal transport conveyor prevents resist collapse. 【Features】 ■ Compatible with both sheet substrates and flexible substrates using Roll to Roll ■ No scum left behind due to spray application ■ Well-designed horizontal transport conveyor ■ No resist collapse occurs *For more details, please refer to the PDF materials or feel free to contact us.
Manual spin coater and manual spin developer that meet a wide range of needs from research and development to production.
The Riso Spin Cup Series adopts a spin unit equivalent to automatic coating/developing equipment while being manual, and it comes standard with features such as auto dispensers, various rinses, automatic waste liquid recovery, and cup exhaust. It allows for easy and safe high-precision resist processing. Additionally, we offer various options such as primary dispensers, chemical temperature control, fan filter units, and temperature/humidity controllers, enabling advanced coating and developing processes. At Risotech Japan, we design and manufacture equipment tailored to the coating chemicals (resist, polyimide, insulating films, etc.) and wafer sizes and applications used by our customers, providing sophisticated equipment.
Spin coating device
The process from developing the resist film applied on the glass substrate while rotating it to rinsing with pure water is performed automatically. 【Features】 ● A developing solution purge mechanism is provided, making it easy to change the type of developing solution. ● A robot is used for the left-right movement of the nozzle. The nozzle movement can be set arbitrarily over a wide range of 0 to 400 mm. ● The vertical position of the nozzle can be set arbitrarily over a wide range of 0 to 500 mm. *For details, please request the materials.
For anything related to etching machine production, Kimura Etching.
We design and manufacture various wet processing equipment (etching, developing, stripping, cleaning, etc.) for applications ranging from research and development experimental devices to production equipment. The main material for the equipment body is PVC, but we also manufacture using PP, PVDF, and SUS depending on the chemicals and temperatures used. All of our equipment is custom-made to meet the specific requirements of our customers. We also undertake on-site work such as equipment modifications and relocations.
[Non-destructive Testing - RT] Stable quality achieved through the use of large tanks! Increased water volume in the washing system.
The "FNDX5 HS" is a medium-sized industrial X-ray film processor that can process from development to drying in 8 minutes. By increasing the water volume in the washing system and adding a heater in the washing tank, the film's preservation quality has been improved. Additionally, it is now possible to install an auto-loader that significantly shortens processing time. Please feel free to contact us if you have any requests. 【Features】 ■ Standby mode ■ Oxidation prevention function ■ Comprehensive maintenance system ■ Improved film preservation ■ Auto-loader installation available *For more details, please refer to the PDF document or feel free to contact us.
By adopting large tanks, we achieve stable film stability in non-destructive testing and radiographic testing!
The "FNDX 9A" is a large industrial X-ray film automatic developer that can process from development to drying in 10 minutes. It inherits the high quality and processing stability of the large automatic developer FIP7000. Power consumption is reduced during standby mode when not processing film. Additionally, during standby mode, an oxidation prevention cycle is initiated, eliminating the effects of oxidation. 【Features】 ■ Processing stability ■ Energy efficiency ■ Oxidation prevention function ■ Auto loader/Auto mixer (optional) ■ Comprehensive maintenance system *For more details, please refer to the PDF document or feel free to contact us.
