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Developing device Product List and Ranking from 24 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Developing device Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. エイ・エス・エイ・ピイ Saitama//Electronic Components and Semiconductors
  2. 二宮システム Osaka//others
  3. 東京エレクトロン九州 Kumamoto//Electronic Components and Semiconductors
  4. 4 ラットコーポレーション 本社：営業部・業務部 Aichi//Trading company/Wholesale
  5. 5 ジャパンクリエイト Saitama//Testing, Analysis and Measurement
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Developing device Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Tokyo Electron Kyushu Product Catalog 東京エレクトロン九州
  2. Liftoff (Image Reversal) Compatible Photoresist Development Equipment エイ・エス・エイ・ピイ
  3. 2-fluid spray type automatic photoresist developing device (developer) エイ・エス・エイ・ピイ
  4. Compact Film Automatic Developing Machine NOVA 日本ベーカーヒューズ株式会社＆ベーカーヒューズ・エナジージャパン株式会社　 （旧）GEセンシング＆インスペクション・テクノロジーズ株式会社　＆　GEエナジー・ジャパン株式会社
  5. Small Developer Machine SP Series SPD40 二宮システム

Developing device Product List

16～30 item / All 51 items

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Non-contact D/F developer

Non-contact D/F developer

The precision of the transport fixture is high! The knife connection part is of the socket type, making disassembly and installation very easy.

This product is a non-contact D/F developer with high precision in transport fixtures and easy maintenance. The use of Wind Jet and PATA-GUN nozzles improves the drying capability of the JIG Clamp section. Lightweight and standard products are used for KnifeAL injection items. Each Knife allows for pressure adjustment, and a pressure gauge is installed on the operation side for easy visual management. 【Features】 ■ Use of Wind Protector & PCB Clamp for high-speed operation ■ Installation of a sensing sensor to detect the presence or absence of the substrate during clamping ■ Application of an ALIGN System to prevent issues during product loading, even with misalignment or irregular input ■ Application of two upper FFUs for particle initialization (Option) ■ Driven by LD/ULD & 6-axis articulated robot with PLC control *For more details, please refer to the PDF materials or feel free to contact us.

  • others

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Tokyo Electron Kyushu Product Catalog

Tokyo Electron Kyushu Product Catalog

Featuring the latest products from Tokyo Electron Kyushu, a leading company in semiconductor manufacturing equipment!

The "Tokyo Electron Kyushu Product Guide" is a comprehensive catalog from Tokyo Electron Kyushu, which conducts research, development, and design of semiconductor manufacturing equipment and EPD manufacturing equipment. It features a number of the latest semiconductor coating and developing equipment along with detailed explanations. Additionally, it introduces trends in the current semiconductor coating and developing equipment research projects, as well as the development projects for semiconductor cleaning equipment. Currently, the product guide is being offered for free. [Contents] ■ Semiconductor Coating and Developing Equipment ■ Semiconductor Cleaning Equipment ■ Wafer Bonding Equipment ■ FPD Coater ■ Introduction to Research and Development of Various Semiconductor Manufacturing Equipment *For more details, please refer to the catalog or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Spray Development Device for Printed Circuit Boards

Spray Development Device for Printed Circuit Boards

New technology for developing printed circuit boards!

Asahi Electric Materials Co., Ltd. offers a "Mist Development System for Printed Circuit Boards" with a unique air slit structure that produces high directivity in the developer solution. Due to the high-pressure misting of the developer solution, deep etching (high aspect ratio) is possible. Unlike liquid, the mist form makes it less likely to form liquid droplets, improving surface uniformity and stabilizing quality. Additionally, since the amount of developer solution used is minimal, development can be carried out with only fresh solution without liquid circulation, and no defoamer is needed, eliminating concerns about issues like sludge. 【Features】 ■ Development time is reduced to less than one-third, improving productivity. ■ The line length is reduced to less than half, allowing for effective use of the equipment installation area. *For more details, please download the PDF or feel free to contact us.

  • Other markings
  • Other image-related equipment

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Symbolic Tech Film Automatic Developer

Symbolic Tech Film Automatic Developer

Equipped with seven programmable process channels that have sufficient flexibility.

The "Symbolic Tech Film Automatic Development Machine" is a device that consolidates all the experience and technology cultivated in PCB film automatic development technology. The intermediate washing system has a take-up roller and performs film cleanup to minimize the carryover of chemicals to the next process. Additionally, the crossover roller that transfers to the next process is positioned above the liquid level and is designed for easy removal and cleaning. 【Standard Features and Accessories】 ■ Removable feed table ■ Upgradeable to higher production capacity at the user site ■ Monitoring of developer liquid levels ■ External filters for development, fixing, and washing ■ Filter replacement timing notification alarm ■ Automatic standby and low power mode ■ Monitoring function *For more details, please download the PDF or feel free to contact us.

  • Other image-related equipment

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Developing equipment for ceramic substrates

Developing equipment for ceramic substrates

Development equipment for ceramic substrates

We contribute to enhancing our customers' added value by utilizing advanced fine processing technology for developing and etching, as well as advanced thin plate transport technology.

  • Other mounting machines

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Ninomiya System Glass Substrate Development Equipment

Ninomiya System Glass Substrate Development Equipment

Ninomiya System Glass Substrate Development Equipment

Achieving high-precision development through optimal nozzle arrangement.

  • Other semiconductor manufacturing equipment

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Compact! Manual photoresist developing device (manual developer)

Compact! Manual photoresist developing device (manual developer)

It is a compact resist development system for small-lot, multi-variety production and development applications. Unlike DIP, it can stabilize quality due to its sheet-fed design.

This product is a manual sheet-type developing machine. It features a compact design that combines the chemical solution box and processing cup into one unit. We design, manufacture, and sell manual machines tailored to our customers' needs. It is used not only for research and development purposes but also by customers handling small quantities of diverse products. We have a proven track record with various chemicals, including TMAH. 【Features】 ■ Achieves low cost ■ Compact! ■ Options for paddle, single fluid spray, and dual fluid spray ■ Proven performance with a variety of chemicals *For more details, please refer to the PDF document or feel free to contact us.

  • Resist Device

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Maintain a constant reverse taper angle! PEB-compatible resist development equipment (developer)

Maintain a constant reverse taper angle! PEB-compatible resist development equipment (developer)

Keep the negative taper angle constant! This is an automatic resist development system compatible with post-exposure bake (PEB) required for negative resist and image reversal resist.

Equipped with sheet-type development, full exposure (inverted exposure, image reversal), baking, and cooling functions. An important PEB that determines the angle of the reverse taper using lift-off resist. Our proprietary program stabilizes the reverse taper angle! Additionally, using it for baking after exposing negative resist achieves a stable process. With a lineup tailored to production volume, from manual machines to fully automatic machines, we have realized low prices by handling everything from design to manufacturing and sales in-house. We have a proven track record with a variety of chemicals such as TMAH, colin aqueous solution, and Na2CO3. We also have numerous achievements with thin wafers (such as wafer thickness of 150um), so please feel free to consult us. 【Features】 ■ Stability of reverse taper angle through PEB ■ Automatic wafer size recognition function ■ Compatible with paddle, single-fluid spray, and dual-fluid spray ■ Reduced footprint ■ Lineup tailored to production volume We also have demo equipment available, so please consider scheduling a demonstration!

  • Resist Device

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Automatic resist coating and developing equipment for corner substrates (coater-developer)

Automatic resist coating and developing equipment for corner substrates (coater-developer)

Supports low to high viscosity resist! Equipment can be manufactured for any wafer size!

The product is equipped with spin coating, HMDS treatment, baking, and cooling functions. Since we handle everything from design to manufacturing and sales in-house, we have achieved low prices! We have a proven track record with a variety of chemicals including positive-negative resist, polyimide, SOG, wax, and silicone. We also have extensive experience in transporting various substrates such as Si (silicon), GaAs, InP, GaN, SiC, sapphire, and ceramic, as well as SiO2 (glass). We have numerous achievements in transporting thin substrates and square substrates, such as GaAs (thickness 150um), InP (thickness 150um), and LT (thickness 120um)! 【Features】 ■ Achieves low prices ■ Capable of handling low to high viscosity (1.7cP to 10000cP) ■ Uniform film distribution through a rotating cup coating method ■ Compatible with 2 to 12 inches ■ Capable of processing multiple types of wafers (compatible with 3, 4, and 5 inches) ■ Automatic recognition of wafer size ■ Proven track record with a variety of chemicals ■ Reduced footprint (space-saving) ■ Numerous options for resist reduction ■ Lineup tailored to production volume *For more details, please refer to the PDF document or feel free to contact us.

  • Coater

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Spray/Paddle Combined Small Spin Developer (Developer)

Spray/Paddle Combined Small Spin Developer (Developer)

Pursuing high quality, low price, and space-saving; a developer that supports both swing spray and paddle methods.

The multi-step program can save 99 steps × 50 patterns. Options such as liquid system expansion and liquid temperature control systems are also available. Please consult us for other sizes and custom specifications.

  • Resist Device
  • Etching Equipment
  • Other semiconductor manufacturing equipment

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Spin Cleaning Device Spray Development Device SD-8004 Type

Spin Cleaning Device Spray Development Device SD-8004 Type

Automatic and manual operation will perform developing, rinsing, washing, and spin drying!

The SD-8004 model is a spin spray development system for 4" to 8" wafers. It performs developing, rinsing, water washing, and spin drying through automatic and manual operation. Condition settings are done via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during the respective mode. For more details, please contact us or refer to the catalog.

  • Coater
  • Other semiconductor manufacturing equipment

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Small developing device for photolithography

Small developing device for photolithography

Small developing device for photolithography

Swing nozzle type spray development and paddle development compatible device 【Features】 - High performance, low price, compact tabletop type - Work size Φ1" to Φ6" - Easy operation with program input via LCD touch panel - Built-in dual liquid pressure delivery pumps ◆ For detailed specifications, refer to the catalog ◆

  • Etching Equipment

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Organic solvent-based spin development device WSD-200T

Organic solvent-based spin development device WSD-200T

Device dimensions: 1700W × 1300D × 1400H

Set the substrate manually in the chuck, then perform paddle development, rinsing, and spin drying. A canister can be stored on the side of the main unit.

  • Other semiconductor manufacturing equipment

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Fully automatic screen printing processor

Fully automatic screen printing processor

Fully automatic screen printing developing machine

As a manufacturer of screen printing machines, we have created screen plate processing equipment that embodies our commitment and experience in screen plates. Traditionally, the development process of screen plates after exposure has been done manually using spray guns and other tools. However, due to the recent refinement of printing patterns and the increase in screen plate sizes, meeting the required quality for plate making has become increasingly difficult. That’s why we recommend the Mino Screen Processor 2! This is a renewed version of the popular Mino Screen Processor, now equipped with more user-friendly specifications. Its uniform and powerful cleaning capability, unique to fully automatic operation, ensures high plate making accuracy. Additionally, it comes standard with a backlight, making it easy to check for any gaps in the plate. The standard-equipped sash door prevents cleaning noise and leakage of developing water, ensuring a comfortable working environment. By recycling the developing water, it also helps reduce costs and lessen the environmental impact.

  • Other processing machines

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