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Developing device Product List and Ranking from 24 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

Developing device Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

  1. エイ・エス・エイ・ピイ Saitama//Electronic Components and Semiconductors
  2. 富士フイルム 検査・測定 Tokyo//Testing, Analysis and Measurement
  3. 東京エレクトロン九州 Kumamoto//Electronic Components and Semiconductors
  4. 4 ラットコーポレーション 本社：営業部・業務部 Aichi//Trading company/Wholesale
  5. 5 カナメックス 厚木工場 Kanagawa//Electronic Components and Semiconductors
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Developing device Product ranking

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

  1. Non-destructive testing industrial X-ray film automatic developer 'FNDX 9A' 富士フイルム 検査・測定
  2. Tokyo Electron Kyushu Product Catalog 東京エレクトロン九州
  3. Static development type (paddle) automatic photoresist development device (developer) エイ・エス・エイ・ピイ
  4. 4 Automatic photoresist coating and developing equipment (coater-developer) エイ・エス・エイ・ピイ
  5. 5 2-fluid spray type automatic photoresist developing device (developer) エイ・エス・エイ・ピイ

Developing device Product List

31～51 item / All 51 items

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Semiconductor and printed circuit board horizontal manufacturing equipment: Developing equipment (pattern formation)

Semiconductor and printed circuit board horizontal manufacturing equipment: Developing equipment (pattern formation)

Supports everything from single-sided substrates to flexible substrates using Roll to Roll! No resist fall-off occurs.

Introducing the developing equipment for pattern formation handled by Fujikiko Co., Ltd. Compatible with both sheet substrates and flexible substrates using Roll to Roll. Thanks to the spray application, there is no scum left behind, and the well-designed horizontal transport conveyor prevents resist collapse. 【Features】 ■ Compatible with both sheet substrates and flexible substrates using Roll to Roll ■ No scum left behind due to spray application ■ Well-designed horizontal transport conveyor ■ No resist collapse occurs *For more details, please refer to the PDF materials or feel free to contact us.

  • Substrate transport device (loader/unloader)
  • Circuit board processing machine
  • Developing device

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Manual Coating Device/Developing Device Litho Spin Cup

Manual Coating Device/Developing Device Litho Spin Cup

Manual spin coater and manual spin developer that meet a wide range of needs from research and development to production.

The Riso Spin Cup Series adopts a spin unit equivalent to automatic coating/developing equipment while being manual, and it comes standard with features such as auto dispensers, various rinses, automatic waste liquid recovery, and cup exhaust. It allows for easy and safe high-precision resist processing. Additionally, we offer various options such as primary dispensers, chemical temperature control, fan filter units, and temperature/humidity controllers, enabling advanced coating and developing processes. At Risotech Japan, we design and manufacture equipment tailored to the coating chemicals (resist, polyimide, insulating films, etc.) and wafer sizes and applications used by our customers, providing sophisticated equipment.

  • Other physicochemical equipment
  • Developing device

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Spin coating device

Spin coating device

Spin coating device

The process from developing the resist film applied on the glass substrate while rotating it to rinsing with pure water is performed automatically. 【Features】 ● A developing solution purge mechanism is provided, making it easy to change the type of developing solution. ● A robot is used for the left-right movement of the nozzle. The nozzle movement can be set arbitrarily over a wide range of 0 to 400 mm. ● The vertical position of the nozzle can be set arbitrarily over a wide range of 0 to 500 mm. *For details, please request the materials.

  • Analytical Equipment and Devices
  • Developing device

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Automatic Conveying Development Device ACT-300A2S

Automatic Conveying Development Device ACT-300A2S

It is a compact automatic transport-type developing device.

The automatic conveyance development device "ACT-300A2S" is a machine that performs spray development while rotating substrates up to 6 inches in size. It is equipped with two systems for developing solution, one system for rinsing, and an air knife, allowing recipe settings to be operated via a touch panel, enabling automatic development processing of up to 25 pieces. *There is also a sheet-type model available without automatic processing. 【Main Specifications】 ○ Processing Capacity: Capable of continuous processing of up to 25 round substrates of 6 inches ○ Process: Developing solution: 2 systems, Rinsing: 1 system, Air knife: 1 system ○ Chemicals Used: Alkaline developing solution, deionized cleaning water For more details, please contact us or download the catalog.

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  • Other processing machines
  • Developing device

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Research and development experimental device - Spin development device

Research and development experimental device - Spin development device

For anything related to etching machine production, Kimura Etching.

We design and manufacture various wet processing equipment (etching, developing, stripping, cleaning, etc.) for applications ranging from research and development experimental devices to production equipment. The main material for the equipment body is PVC, but we also manufacture using PP, PVDF, and SUS depending on the chemicals and temperatures used. All of our equipment is custom-made to meet the specific requirements of our customers. We also undertake on-site work such as equipment modifications and relocations.

  • others
  • Developing device

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Industrial X-ray film automatic developing machine 'NOVA'

Industrial X-ray film automatic developing machine 'NOVA'

Excellent durability, high quality and performance! We meet our customers' strict demands for quality.

"NOVA" is an automatic developing machine developed for non-destructive testing as part of the AGFA NDT film system. This compactly designed product is environmentally friendly, highly durable, and equipped with high quality and performance. We meet our customers' strict demands for quality. 【Features】 ■ Top-level cost performance ■ Equipped with an infrared drying system for consistent results ■ Compact size and lightweight ■ Easy operation suitable for everyone ■ Simple structure for easy maintenance *For more details, please refer to the PDF document or feel free to contact us.

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  • Other inspection equipment and devices
  • Developing device

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Non-destructive testing industrial X-ray film automatic developer 'FNDX5HS'

Non-destructive testing industrial X-ray film automatic developer 'FNDX5HS'

[Non-destructive Testing - RT] Stable quality achieved through the use of large tanks! Increased water volume in the washing system.

The "FNDX5 HS" is a medium-sized industrial X-ray film processor that can process from development to drying in 8 minutes. By increasing the water volume in the washing system and adding a heater in the washing tank, the film's preservation quality has been improved. Additionally, it is now possible to install an auto-loader that significantly shortens processing time. Please feel free to contact us if you have any requests. 【Features】 ■ Standby mode ■ Oxidation prevention function ■ Comprehensive maintenance system ■ Improved film preservation ■ Auto-loader installation available *For more details, please refer to the PDF document or feel free to contact us.

  • X-ray inspection equipment
  • Developing device

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Non-destructive testing industrial X-ray film automatic developer 'FNDX 9A'

Non-destructive testing industrial X-ray film automatic developer 'FNDX 9A'

By adopting large tanks, we achieve stable film stability in non-destructive testing and radiographic testing!

The "FNDX 9A" is a large industrial X-ray film automatic developer that can process from development to drying in 10 minutes. It inherits the high quality and processing stability of the large automatic developer FIP7000. Power consumption is reduced during standby mode when not processing film. Additionally, during standby mode, an oxidation prevention cycle is initiated, eliminating the effects of oxidation. 【Features】 ■ Processing stability ■ Energy efficiency ■ Oxidation prevention function ■ Auto loader/Auto mixer (optional) ■ Comprehensive maintenance system *For more details, please refer to the PDF document or feel free to contact us.

  • X-ray inspection equipment
  • Developing device

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Emulsion Glass Automatic Developer EL-GP

Emulsion Glass Automatic Developer EL-GP

The unique control system enables the reproducibility of patterns.

The "Emulsion Glass Automatic Developing Machine EL-GP" is an automatic developing device for glass masks, equipped with a transport robot that moves emulsion masks between six processing tanks and the loader/unloader, as well as an automatic liquid replenishment system. Processing conditions can be set using a touch panel. The loader can hold five (standard) emulsion masks. Once set in the loader, it automatically processes continuously. 【Features】 - Achieves uniformity in developing processing across the surface through a unique processing control system. - Ensures stable processing reproducibility by adopting a multi-mode liquid replenishment system. - Ultra-compact design allows installation in small-sized clean rooms. - Significantly improves workflow by being adjacent to the drawing machine. - Reduces waste liquid volume through liquid conservation, making it environmentally friendly. For more details, please refer to the catalog or feel free to contact us.

  • Photomask
  • Developing device

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【Koreta Corporation】Automatic Developer for PCB Film

【Koreta Corporation】Automatic Developer for PCB Film

We would like to introduce an automatic developing machine for PCB films that accommodates processing widths from 56cm to 110cm.

The "NG Model / NGs Model" automatic developing machine for PCB film, manufactured by Colenta and handled by Rat Corporation, is a newly developed automatic developing machine for PCB film. A PRE washing tank is installed between each tank, maintaining a consistently clean state and eliminating liquid carryover between tanks. If a reduction in developing time or an increase in developing capacity is needed, you can easily upgrade by replacing the NG version rack with a deeper NGs rack. There are two types of models available: NG and the more capable NGs. **Features** - Equipped with filters for developing and fixing - Filter replacement warning sensor - Six sensors automatically calculate the film area and execute appropriate liquid replenishment *For more details, please refer to the catalog or feel free to contact us.*

  • Other processing machines
  • Developing device

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Chrome Mask Automatic Developer

Chrome Mask Automatic Developer

Complete automation of development/etching! Ensures consistent production of high-quality products.

We handle the "Chrome Mask Automatic Developer" developed by Corenta Co., Ltd. This product processes pre-exposed chrome masks loaded onto a "hanger" while minimizing operator involvement in each step: resist development, rinsing, chrome etching, rinsing, resist stripping, cleaning, and drying. We offer two models equipped with a circulation and filtration system that includes appropriate chemical treatment (replenishment, antioxidant program) as standard. [Product Lineup] ■ GP1/6T ■ GP9/6T *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • others
  • Photomask
  • Developing device

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Industrial film automatic developing machine INDX [43/55・43/5MW]

Industrial film automatic developing machine INDX [43/55・43/5MW]

Added water-saving features to the water supply line! Reduced the amount of chemicals with the structure of the tank and rack!

This product is an industrial film automatic developing machine designed with a focus on the environment, achieving compactness and space-saving, while reducing chemical usage and power consumption. It allows for combinations of 9 channels, including speed control, developing temperature, fixing temperature, and replenishment amount. The current processing status is displayed, and depending on the developing liquid temperature, the processing time can be adjusted from 3 to 17 minutes for "43/55" and from 2 to 12 minutes for "43/5MW." 【Features】 - Compact, space-saving design - Fully automatic control via electronic control - Reduced tank capacity - Structure durable for long-term use - Stable processing quality - Accurate replenishment for processed film *For more details, please refer to the PDF document or feel free to contact us.

  • Other processing machines
  • Other inspection equipment and devices
  • Developing device

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For the development and manufacturing of various machines and equipment, Ohtomo Manufacturing Company <Business Introduction>

For the development and manufacturing of various machines and equipment, Ohtomo Manufacturing Company <Business Introduction>

We manufacture "development equipment" that uses liquids, such as semiconductors, LCDs, and plating processes, with a flexible production system that accommodates both custom and mass production! We bring those needs to life!

Ohtomo Manufacturing Co., Ltd. has been providing numerous products since its establishment in 1945. All the technologies and know-how honed over this long history are utilized in our current manufacturing, which always aims for the highest quality. Ohtomo's quality satisfies our customers at every process, from design and development to manufacturing and aftercare. We will continue to realize and provide our customers' needs with maximum creativity and effort. 【Business Content】 ○ Development and manufacturing of various film automatic developing machines and custom equipment For more details, please contact us or download the catalog.

  • Other processing machines
  • Other image-related equipment
  • Developing device

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Puriken Co., Ltd. Printed Circuit Board Patterning (Outer Layer)

Puriken Co., Ltd. Printed Circuit Board Patterning (Outer Layer)

After the finishing in the developing room and the process in the clean room, it will be developed in the developing room!

Our company performs "patterning (outer layer)" using process equipment. In the clean room, to protect the through-hole plating, after forming the through-hole with copper plating, a photosensitive dry film is applied. The film is adhered to the substrate, and after exposure to ultraviolet light, the unexposed areas are swollen and removed in the developing room. 【Features of Photosensitive Dry Film】 ■ Photosensitive resist in film form ■ Sandwich structure sandwiched between polyester film and polyethylene film *For more details, please refer to the PDF document or feel free to contact us.

  • Circuit board design and manufacturing
  • Developing device

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Large substrate (panel level, square substrate) developing equipment

Large substrate (panel level, square substrate) developing equipment

Automatically executes a series of processes from developing to rinsing and spin drying!

We would like to introduce our "Large Substrate (Panel Level, Square Substrate) Development Equipment." By simply setting a FOUP or dedicated cassette in the load port, a clean robot automatically transports the workpiece and performs a series of processes including development, rinsing, and spin drying. We can also accommodate the production of manual development equipment. The workpiece sizes supported are 300x300mm, 510x515mm, and 600x600mm. The materials compatible with the workpieces include Si, resin, glass, SUS plates, etc., and it is possible to integrate the development liquid supply unit within the equipment (canister or poly tank). 【Specifications (partial)】 ■ Development liquid: TMAH, Na2CO3, cyclopentane, etc. (independent chamber) ■ Rinse liquid: DIW, PGMEA, etc. ■ Back rinse: PGMEA, etc. ■ Application method: Shower or nozzle ■ Bake: 90℃ to 120℃ ±1℃ ■ Cool plate: 10℃ to 25℃ *For more details, please download the PDF or feel free to contact us.

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  • Other cleaning machines
  • Developing device

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Research and development small-sized developing device HPD40

Research and development small-sized developing device HPD40

Small Development Printing Device for Research and Development HPD40

【Process】Input → Development → Liquid Cutting → Water Wash 1 → Water Wash 2 → Squeezing → Extraction 【Substrate Size】Max. W400×L500mm Thickness 0.4〜2.0mm 【Nozzle Swing】Horizontal Swing 【Device Size】W1420×L1950×H1645mm - Space-saving for research - Ideal for material development and testing - Capable of developing PCBs and LCDs

  • Other surface treatment equipment
  • Circuit board processing machine
  • Other laboratory equipment and containers
  • Developing device

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Sheet-type automatic spin developing device

Sheet-type automatic spin developing device

Device dimensions: 2000W × 1200D × 2000H (200WCBT) / 2000W × 1500D × 2000H (300WCBT)

This is a sheet-type automatic spin developing device that sets the set in the loader, transports the substrate with a clean robot, and performs paddle development, rinsing, and spin drying. It can accommodate two chemical supply tanks or waste liquid tanks (20L) on the side of the main body.

  • Other semiconductor manufacturing equipment
  • Developing device

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Small Development Machine for Research and Development - SPD40

Small Development Machine for Research and Development - SPD40

Research and development small-sized developer SPD40

【Process】Input → Development → Liquid Cutting → Circulating Water Wash → Direct Water Wash → Squeezing → Extraction 【Substrate Size】Max. W400×L500mm Thickness 0.4-2.0mm 【Nozzle Swing】Horizontal Swing 【Device Size】W1300×L1590×H1215mm - Space-saving for research use - Ideal for material development and testing - Capable of developing PCBs and LCDs

  • Other surface treatment equipment
  • Circuit board processing machine
  • Other laboratory equipment and containers
  • Developing device

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Small thin plate developing device FBD40

Small thin plate developing device FBD40

Small thin plate developing device FBD40

【Process】Input → Air knife → Development → Air knife → Circulating water wash → Direct water wash → Air knife → Extraction 【Board Size】Min. W50×L50mm Thickness 0.03〜2.0mm 【Nozzle Swing】Horizontal swing 【Device Size】W1445×L2010×H1230mm - Space-saving for research - Ideal for material development and testing - Capable of developing PCBs and LCDs

  • Other surface treatment equipment
  • Circuit board processing machine
  • Other laboratory equipment and containers
  • Developing device

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Compact Ultra-High Precision Development Device MPD40

Compact Ultra-High Precision Development Device MPD40

Compact Ultra-High Precision Development Device MPD40

【Process】 Input → Development → Liquid Drain → Rinse → Liquid Drain → Circulation Water Wash → Direct Water Wash → Squeeze → Extraction 【Board Size】 Max. W400 × L500 mm Thickness 0.4 to 2.0 mm 【Nozzle Swing】 Neck Swing 【Device Size】 W1530 × L2830 × H1860 mm - Space-saving for research - Ideal for material development and testing - Capable of developing PCBs and LCDs

  • Other surface treatment equipment
  • Circuit board processing machine
  • Other laboratory equipment and containers
  • Developing device

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Semi-automatic photoresist developing equipment (semi-auto developer)

Semi-automatic photoresist developing equipment (semi-auto developer)

It is a semi-automatic developer for customers who do not have a high enough production volume to purchase a fully automated machine but seek process reproducibility.

This product is equipped with a sheet-fed development, baking, and cooling unit. It is recommended for customers who have a production volume that is not high enough to introduce an automatic machine, but cannot adopt a manual machine due to labor issues! We design and manufacture semi-automatic machines tailored to your needs, so if you are having trouble introducing new equipment, please consider us! We have a proven track record with various chemicals such as TMAH. 【Features】 ■ Automatic transport function ■ Achieves low cost ■ Proven track record with various chemicals ■ Reduced footprint *Please feel free to contact us for more details.

  • Resist Device
  • Developing device

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