Photo etching
We accept small-scale prototypes using precision photographic technology for fine processing.
We accept small-scale prototypes using photolithography and precision photography technology, which are essential technologies in MEMS and display devices. We form thin films on substrates such as glass substrates, silicon wafers, films, and ceramics, and create fine patterns through a consistent photolithography process. We can accommodate prototypes starting from a single piece. We also support prototypes for dicing and bump formation. Additionally, we can pattern dielectric films and multilayer films using lift-off processing. Substrate sizes can be customized as needed. Etching of silicon wafers and glass substrates is also possible. We can respond with short lead times (consultation required) and can accommodate rigid and FPC substrates. For more details, please contact us or refer to our catalog.
- Company：豊和産業
- Price：Other
