High-pressure pulse jet DP-Gun for cleaning masks, glass, and wafers.
With the same pressure, the water usage is 1/3; with the same flow rate, the pressure is three times higher; and with a lower flow rate, there are repeated impacts. For removing slurry after mask and glass cleaning wafer polishing.
A cleaning nozzle unit that requires less water and is less likely to create a water film, which can be retrofitted to existing equipment. A cleaning nozzle that operates at a maximum of 30Hz. A pump that generates high-pressure water of 5 to 10 MPa. A combination with a control unit. Conventional continuous spraying applies pressure over the water film it creates, leading to an increase in cleaning power, which means higher pressure, increased flow rate, and thicker water film. However, the DP-Gun uses intermittent spraying, resulting in lower flow rates at the same pressure (impact), making it less likely to form a water film and allowing the sprayed water to directly impact the target object. By repeatedly applying intermittent spray impacts, it demonstrates excellent cleaning effects for removing foreign substances from the items being cleaned, cleaning masks, and cleaning three-dimensional objects such as cassettes (with narrow grooves and complex shapes). The pump unit achieves stable water pressure control with minimal waste water during pressure adjustments by performing feedback control in accordance with flow rate changes caused by the opening and closing of the nozzle. *Please consult us regarding spraying a fixed amount of liquid and measuring + spray application. *Nozzles and pumps require regular maintenance.
- Company：株式会社ダン科学 入間営業所
- Price：Other
![Pipe cleaning [chemical selection, heat exchangers, buried piping also possible]](https://image.mono.ipros.com/public/product/image/10e/2000329210/IPROS5277721136008196183.jpg?w=280&h=280)
