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target Product List and Ranking from 26 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

target Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  2. エドモンド・オプティクス・ジャパン Tokyo//Optical Instruments
  3. ウエキコーポレーション Tokyo//Chemical
  4. 井嶋金銀工業 Tokyo//Manufacturing and processing contract
  5. 5 MSHシステムズ Tokyo//Optical Instruments
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target Product ranking

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. Hafnium (Hf) target SPUTTERCORE CO.,LTD.
  2. Niobium oxide (Nb2O5) target SPUTTERCORE CO.,LTD.
  3. High purity sputtering target, manufactured by PRAXAIR. ウエキコーポレーション
  4. Aluminum Silicon (Al-Si) Target [Alloy Target] SPUTTERCORE CO.,LTD.
  5. 4 Sputtering target 井嶋金銀工業

target Product List

61～75 item / All 118 items

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Hafnium (Hf) target for display applications

Hafnium (Hf) target for display applications

Contributing to the improvement of display quality with high-purity Hf targets.

In the display industry, thin film formation technology significantly influences product performance. In particular, high-quality thin film formation using sputtering technology requires high-purity Hf targets. The purity and uniformity of Hf targets greatly impact the display's visual performance and durability. Our products provide high-purity Hf targets, contributing to the quality enhancement of our customers' display products. 【Usage Scenarios】 - Sputtering process in display manufacturing - Thin Film Transistor (TFT) manufacturing - Touch panel manufacturing 【Effects of Implementation】 - Improved display performance through high-quality thin film formation - Enhanced product durability - Improved yield

  • Other metal materials

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Hafnium (Hf) target for measuring instruments

Hafnium (Hf) target for measuring instruments

Support for improving sensor performance with high-purity Hf targets.

In the measurement equipment industry, particularly in the sensor field, high precision measurements and stable performance are required. The performance of sensors is greatly influenced by the quality of the materials used, with the purity and uniformity of the target materials used for thin film formation being especially important. Contamination by impurities and non-uniformity in film thickness can lead to reduced sensitivity and malfunctions in sensors. Our high-purity Hf targets address these challenges and contribute to the improvement of sensor reliability. 【Application Scenarios】 - High-precision sensors - Environmental measurement equipment - Medical sensors 【Benefits of Implementation】 - Improved sensor performance with high-purity materials - Enhanced stability through uniform thin film formation - Elimination of internal defects through UT inspection

  • Other metal materials

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Hafnium (Hf) target for optical lenses

Hafnium (Hf) target for optical lenses

Support for improving the performance of optical lenses with high-purity Hf targets.

In the optical lens industry, high transmittance and durability are required. Particularly for lenses exposed to ultraviolet light and high-temperature environments, the purity and uniformity of the materials are essential for maintaining lens performance. Inappropriate materials or manufacturing processes can lead to degradation of lens performance and a decrease in lifespan. Our high-purity Hf target contributes to the improvement of optical lens performance due to its high purity and uniformity. 【Application Scenarios】 - Optical lens manufacturing - Coating - Sputtering 【Benefits of Implementation】 - Improved lens transmittance - Enhanced lens durability - Increased stability of film formation

  • Other metal materials

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Tungsten (W) target for display applications

Tungsten (W) target for display applications

Tungsten (W) target purity ≧ 5N

In the display industry, thin film formation technology is a crucial factor that influences product performance and quality. In particular, to enhance the display performance, the formation of uniform and high-quality thin films is essential. The use of inappropriate target materials can degrade the quality of the thin films and negatively impact the brightness and contrast of the display. Our tungsten (W) targets enable the formation of high-purity and uniform thin films, contributing to the high performance of displays. 【Application Scenarios】 - Thin film formation in display manufacturing - High-definition displays, organic EL displays, liquid crystal displays - Thin film formation through sputtering 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Uniform film thickness and high adhesion - Increased yield and cost reduction

  • Other metal materials

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Aerospace Tungsten (W) Target

Aerospace Tungsten (W) Target

For high-temperature applications in the aerospace field. High-purity tungsten target.

In the aerospace industry, the durability of components under high-temperature conditions is essential. Particularly for heat-resistant components such as rocket engines and aircraft turbine blades, it is crucial to prevent material degradation and maintain performance over extended periods. Improper material selection can lead to component failure or performance deterioration. Our tungsten (W) targets are of high purity and possess excellent heat resistance. The sputtering technology enables uniform film formation, contributing to the manufacturing of heat-resistant components in the aerospace field. 【Application Scenarios】 - Rocket engine nozzles - Coatings for aircraft turbine blades - Heat shields for space exploration vehicles 【Benefits of Implementation】 - Increased lifespan of components in high-temperature environments - Achievement of high heat resistance and durability - Uniform film formation through sputtering

  • Other metal materials

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Tungsten (W) Target for the Energy Industry

Tungsten (W) Target for the Energy Industry

Tungsten (W) target purity ≧ 5N

In the energy industry, especially in applications that require corrosion resistance, the durability of materials is extremely important. Selecting materials that can withstand harsh environments is essential for ensuring the long-term reliability and safety of products. Tungsten (W) targets provide excellent corrosion resistance and contribute to the stable operation of energy-related equipment. 【Application Scenarios】 - Use in corrosive environments - Use in high-temperature environments - Applications requiring high durability 【Benefits of Implementation】 - Prolonged equipment lifespan - Reduced maintenance costs - Stable performance maintenance

  • Other metal materials

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[Tungsten (W) Target for Research Institutions]

[Tungsten (W) Target for Research Institutions]

Improving the reliability of experiments with high-purity tungsten (W) targets.

In experiments conducted at research institutions, obtaining high-precision data is crucial. Particularly in sputtering experiments, the quality of the target material significantly affects the experimental results. Contamination and lack of uniformity can compromise the reliability of the experimental data. Our tungsten (W) targets are of high purity (≧5N), contributing to enhanced reproducibility of experiments. 【Application Scenarios】 - Sputtering experiments - Thin film formation experiments - Material property evaluation 【Benefits of Implementation】 - Acquisition of reliable experimental data with high-purity materials - Improvement of experimental accuracy through uniform film thickness formation - Adaptability to various experiments with W alloy targets

  • Other metal materials

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Tungsten (W) target for electronic components

Tungsten (W) target for electronic components

Tungsten (W) target purity ≧ 5N

In the electronic components industry, the bonding process is a crucial factor that affects product reliability. Particularly for electronic components exposed to high temperatures and vibrations, the quality of the joints significantly influences product lifespan. Poor bonding can lead to decreased performance and early failure of the product. Our tungsten (W) targets achieve high-quality bonding and contribute to the improvement of electronic component reliability. 【Application Scenarios】 - Bonding of semiconductor devices - Bonding of electronic circuit boards - Electrode formation for electronic components 【Benefits of Implementation】 - High-quality bonding with high-purity tungsten - Improved reliability of joints through uniform film formation - Ability to meet diverse bonding needs with W alloy targets

  • Other metal materials

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Tungsten (W) target for precision instruments

Tungsten (W) target for precision instruments

For thin film formation of precision machinery. High purity tungsten (W) target.

In the precision machinery industry, the accuracy of thin film technology is becoming increasingly important due to the demand for higher performance and miniaturization of products. Particularly for precision components that require durability and reliability, the formation of high-quality thin films is essential. Low-quality thin films can lead to decreased product performance and shortened lifespan. Our tungsten (W) targets enable high-quality sputtering deposition, providing optimal materials for thin film formation in precision machinery. 【Application Scenarios】 - Sensors - MEMS devices - Optical components - Electronic components 【Benefits of Implementation】 - High-precision thin film formation - High durability - Uniform film thickness - Compatibility with various materials

  • Other metal materials

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Aerospace Tantalum (Ta) Target

Aerospace Tantalum (Ta) Target

Tantalum (Ta) target purity ≧ 5N

In the aerospace industry, the durability of components in high-temperature environments is crucial. Particularly for rocket and aircraft engine parts, materials with excellent heat resistance and corrosion resistance are required. Traditional materials have faced issues with degradation and corrosion in high-temperature environments. Our tantalum (Ta) target offers high heat resistance and excellent corrosion resistance, enhancing reliability in aerospace applications. 【Application Scenarios】 - Rocket engine parts - Aircraft engine parts - Components used in high-temperature environments 【Benefits of Implementation】 - Improved heat resistance - Enhanced corrosion resistance - Increased lifespan of components

  • Other metal materials

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Tantalum (Ta) target for automotive sensors

Tantalum (Ta) target for automotive sensors

Tantalum (Ta) target purity ≧ 5N

In the automotive industry, sensor technology requires high precision and durability. Especially for sensors used in harsh environments, the reliability of materials significantly affects performance. Tantalum (Ta) targets have been developed to meet these demands. 【Application Scenarios】 - In-vehicle sensors - Autonomous driving systems - Safe driving assistance systems 【Benefits of Implementation】 - Realization of high-sensitivity sensors - Extension of sensor lifespan - Assurance of stable performance

  • Other metal materials

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Tantalum (Ta) target for communication purposes

Tantalum (Ta) target for communication purposes

Tantalum (Ta) target purity ≧ 5N

In the telecommunications industry, particularly for high-frequency applications, the transmission efficiency of signals and the durability of devices are important challenges. High-frequency devices are susceptible to high-temperature environments and the effects of electromagnetic waves, and the quality of the materials used greatly influences performance. Tantalum (Ta) targets possess high heat resistance, excellent corrosion resistance, and good conductivity, addressing these challenges. Our tantalum (Ta) targets enable the formation of high-quality thin films, contributing to the high performance of communication devices. 【Application Scenarios】 - High-frequency filters - High-frequency amplifiers - Communication satellite components - 5G base stations 【Benefits of Implementation】 - Improved high-frequency characteristics - Extended device lifespan - Enhanced stability of signal transmission - Increased thin film deposition efficiency

  • Other metal materials

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Tantalum (Ta) target for jewelry.

Tantalum (Ta) target for jewelry.

High-purity tantalum (Ta) target that enhances the beauty of jewelry.

In the jewelry industry, a beautiful appearance and high durability are essential in design. Particularly as design diversification progresses, the expressiveness of metallic luster and color significantly influences the appeal of products. Tantalum (Ta) targets are a crucial element in achieving both beauty and durability in surface treatment for jewelry due to their high corrosion resistance and high density. Our tantalum (Ta) targets enrich the design expression of jewelry by providing high-quality thin films to address these challenges. 【Usage Scenarios】 - Decorative items such as rings, necklaces, and bracelets - Decorative components for watches - High-design accessories 【Benefits of Implementation】 - Achieving beautiful metallic luster and color - Extending product lifespan through high corrosion resistance - Realizing design diversity

  • Other metal materials

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Zirconium (Zr) target for nuclear fuel

Zirconium (Zr) target for nuclear fuel

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, currently shipping.

In the nuclear fuel industry, materials with high heat resistance and corrosion resistance are required. In particular, the quality of zirconium alloys is crucial for ensuring the safety of fuel in the harsh environment within a reactor. Zirconium (Zr) targets have been developed to meet these demands. 【Application Scenes】 - Fuel manufacturing for nuclear power plants - Production of zirconium alloys in research and development 【Effects of Introduction】 - Manufacturing of high-quality zirconium alloys - Improvement of fuel safety - Achievement of long-term stable operation

  • Other metal materials

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Zirconium (Zr) target for electronics

Zirconium (Zr) target for electronics

Shipping zirconium (Zr) targets with purity ≥ 3N5 and Hf ≤ 0.2 wt%.

In the electronics industry, high-quality thin film formation is required for sputtering applications. Particularly in the manufacturing of semiconductor devices and electronic components, the purity and uniformity of the target material significantly affect product performance. Zirconium (Zr) targets are utilized in the production of various electronic components due to their excellent corrosion resistance and heat resistance. Our zirconium (Zr) targets enable high-quality thin film formation and contribute to improving the reliability of our customers' products. 【Usage Scenarios】 - Semiconductor manufacturing - Electronic component manufacturing - Thin film formation 【Benefits of Implementation】 - High-quality thin film formation - Improved product reliability - Enhanced sputtering efficiency

  • Other metal materials

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