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target Product List and Ranking from 26 Manufacturers, Suppliers and Companies

Last Updated: Aggregation Period:Dec 24, 2025~Jan 20, 2026
This ranking is based on the number of page views on our site.

target Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Dec 24, 2025~Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  2. エドモンド・オプティクス・ジャパン Tokyo//Optical Instruments
  3. ウエキコーポレーション Tokyo//Chemical
  4. 井嶋金銀工業 Tokyo//Manufacturing and processing contract
  5. 5 MSHシステムズ Tokyo//Optical Instruments

target Product ranking

Last Updated: Aggregation Period:Dec 24, 2025~Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. Hafnium (Hf) target SPUTTERCORE CO.,LTD.
  2. Niobium oxide (Nb2O5) target SPUTTERCORE CO.,LTD.
  3. High purity sputtering target, manufactured by PRAXAIR. ウエキコーポレーション
  4. Aluminum Silicon (Al-Si) Target [Alloy Target] SPUTTERCORE CO.,LTD.
  5. 4 Sputtering target 井嶋金銀工業

target Product List

76~90 item / All 118 items

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Zirconium (Zr) target for display applications

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, in shipment.

In the display industry, the film deposition process requires the formation of high-quality thin films. In particular, the uniformity and adhesion of thin films, which influence the display's performance, are crucial. Zirconium (Zr) targets are materials that meet these demands. 【Application Scenarios】 - Sputtering deposition in display manufacturing - Situations requiring high-quality thin film formation 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Realization of a stable deposition process

  • Other metal materials

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Zirconium (Zr) target for automotive exhaust gases

Support for exhaust gas purification with zirconium (Zr) targets.

In the automotive industry, with the strengthening of exhaust gas regulations, there is a demand for improved exhaust gas purification performance. In particular, the reduction of harmful substance emissions is essential for reducing environmental impact. Zirconium (Zr) targets contribute to the manufacturing of exhaust gas purification catalysts and achieve high purification performance. Our zirconium (Zr) targets provide high quality and stable performance, supporting the development of our customers' exhaust gas purification technologies. 【Usage Scenarios】 - Manufacturing of exhaust gas purification catalysts - Research and development by automobile manufacturers - Quality improvement for catalyst manufacturers 【Effects of Implementation】 - Improved exhaust gas purification performance - Compliance with environmental regulations - Enhanced product reliability

  • Other metal materials

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Zirconium (Zr) target for energy storage

Zirconium (Zr) target, purity ≧ 3N5, Hf ≦ 0.2 wt%, currently shipping.

In the energy storage industry, there is a demand for the development of high-performance materials, and zirconium (Zr) targets may play a significant role in this. In particular, durability and reliability are crucial, and the quality of the target material affects the efficiency of film formation. Our zirconium (Zr) targets enable high-quality film formation and contribute to the performance enhancement of energy storage devices. 【Application Scenarios】 - High-performance batteries - Hydrogen storage 【Benefits of Implementation】 - Improved device performance through high-quality film formation - Assurance of long-term reliability

  • Other metal materials

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Nickel (Ni) target for medical devices

Nickel (Ni) target pursued for biocompatibility.

In the medical device industry, materials with excellent biocompatibility are required. Particularly for devices that come into direct contact with the human body, such as implants and biosensors, the safety and durability of the materials are crucial. Inappropriate materials can cause allergic reactions and adverse effects on tissues. Our nickel (Ni) targets enable thin film formation with consideration for biocompatibility due to their high purity and density. 【Application Scenarios】 - Implant Coating - Biosensors - Medical Devices 【Benefits of Implementation】 - High biocompatibility - Improved durability - Enhanced functionality through precise thin film formation

  • Other metal materials

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Nickel (Ni) target for electronic components

For the electrodes of electronic components. High purity nickel (Ni) target.

In the electronic components industry, the quality of electrode materials is a crucial factor that influences the performance and reliability of products. If the performance of the electrodes is low, it may lead to product malfunctions or a decrease in lifespan. Our nickel (Ni) targets provide high-purity and dense nickel materials, supporting the formation of high-quality electrodes. 【Application Scenarios】 - Electrodes for electronic components 【Benefits of Implementation】 - Improved product performance through high-quality thin film formation - Ensured high reliability

  • Other metal materials

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Nickel (Ni) target for semiconductor thin films

Nickel (Ni) target purity ≧ 4N5. Contributes to the improvement of thin film formation quality.

In the semiconductor industry, thin films are a crucial factor that influences device performance. The quality of thin films is greatly affected by the purity, density, and uniformity of the target material. Contamination by impurities and density variations can lead to a decline in device performance and a decrease in yield. Our nickel (Ni) targets are of high purity and excellent density, enabling the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Formation of metal films through sputtering - Formation of NiCr, NiTi, NiCu, and NiCuTi alloy thin films 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

  • Other metal materials

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Nickel (Ni) target for optical coating

Improving the quality of optical coatings with a nickel (Ni) target.

In the optical industry, coating technology requires high film quality and uniformity. Particularly in optical components such as lenses and filters, even slight irregularities or defects in the coating can significantly affect the product's performance. Our nickel (Ni) target achieves high-quality thin film deposition due to its high purity and dense characteristics, contributing to the enhancement of optical product performance. 【Application Scenarios】 - Lens coating - Anti-reflective coatings - Optical filters 【Benefits of Implementation】 - High-density and uniform film quality - Stabilization of optical properties - Improved product durability

  • Other metal materials

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Aerospace Nickel (Ni) Target

For high-temperature applications in the aerospace field. High-purity nickel target.

In the aerospace industry, the durability of components under high-temperature conditions is crucial. In particular, materials with excellent heat resistance and corrosion resistance are required for jet engine and rocket components. Nickel (Ni) targets have been developed to meet these demands. High-purity nickel is essential for the production of heat-resistant alloys and contributes to the performance enhancement of aerospace components through thin film deposition technology. 【Application Scenarios】 - Jet engine components - Rocket components - Sensors used in high-temperature environments 【Effects of Implementation】 - Improved heat resistance and corrosion resistance - Increased lifespan of components - Enhanced reliability

  • Other metal materials

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List of resolution test targets

Short delivery time with stock sales! All items available for sale from one piece.

Edmund Optics offers a wide range of resolution test targets to meet many imaging measurement needs. Resolution test targets enable users to easily measure the accuracy of their imaging systems and monitor performance over the long-term use of the system, allowing for an extended lifespan of the system. The starter target consists of a circular pattern made up of many wedge-shaped lines, measuring resolution by assessing how well the imaging system can distinguish individual lines. The target with a Ronchi pattern similarly features a series of dense lines that are not wedge-shaped, measuring the performance of the imaging system. Many of the resolution test targets are available in both glass slide and photo paper types. ■ For more details, please visit the official Edmund Optics website via the link below.

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Sputtering target & bonding processing

We offer sales of sputtering targets (planar/cylindrical) and support bonding processing.

For applications such as semiconductors, MRAM, touch panels, anti-reflective films, solar cells (PV), lithium-ion batteries, and displays: - We offer a wide range of support from small-scale prototyping of sputtering targets to mass production supply. - We can provide reliable bonding solutions based on years of experience and knowledge, along with proposals tailored to your budget. - We support not only planar types but also cylindrical targets and bonding that offer cost advantages and excellent yield. - Quality assurance through our proprietary large UT inspection equipment (ultrasonic testing) and quality management system. - In addition to our own facilities, we leverage domestic and international networks to meet diverse needs. - We possess uniquely developed high-quality bonding materials and methods.

  • Non-ferrous metals

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High purity sputtering target, manufactured by PRAXAIR.

As the exclusive domestic agent for Praxair's sputtering targets, we support our customers' manufacturing through a network spread across various regions in Japan.

Aiming for High Quality PRAXAIR has earned a reputation as a leading supplier through extensive research and development, as well as the manufacturing of the highest quality sputtering targets. AdvanTage Tantalum Targets AdvanTage tantalum targets provide consistent and reproducible process performance. They achieve reproducible sputtering film deposition through uniform thickness and mass production quality. Advanced manufacturing techniques generate a uniform microstructure, enhancing initial stability and ensuring consistent sputtering performance throughout the product's lifespan. Certified products are also available for each sputtering equipment manufacturer.

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Thin film materials (targets and deposition materials) for IoT 5G devices.

For those developing small quantities of diverse devices who are not satisfied with existing materials, we provide custom solutions that cater to their needs.

WAVES Corporation offers a wide range of sputtering targets and deposition materials for the semiconductor industry. We are the only partner company of VEM, which boasts over 30 years of experience in the U.S. thin film materials industry. VEM Company Website: https://www.vem-co.com 【Features】 - Purity from 99.9% to 99.9999% - Orders can be placed in small lots - Custom targets can be requested in specific shapes - Enhanced target support available - High quality - Includes analysis certificate and SDS

  • Non-ferrous metals

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[Research Material] Global Market for Sputtering Target Materials

World Market for Sputtering Target Materials: Metal Targets, Alloy Targets, Ceramic Compound Targets, Semiconductors, Solar Energy ...

This research report (Global Sputtering Target Material Market) investigates and analyzes the current status and outlook for the global sputtering target materials market over the next five years. It includes information on the overview of the global sputtering target materials market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The segments by type in the sputtering target materials market include metal targets, alloy targets, and ceramic compound targets, while the segments by application cover semiconductors, solar energy, LCD flat panel displays, and others. The regional segments are divided into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa to calculate the market size of sputtering target materials. It also includes the market share of major companies in sputtering target materials, product and business overviews, and sales performance.

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[Research Material] Global Market for High Purity Alloy Sputtering Targets

Global Market for High Purity Alloy Sputtering Targets: Square Targets, Circular Targets, Shaped Targets, Electronics, Aerospace, Others

This research report (Global High Purity Alloy Sputtering Target Market) investigates and analyzes the current status and outlook for the global market of high purity alloy sputtering targets over the next five years. It includes information on the overview of the global high purity alloy sputtering target market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The market segments by type include square targets, circle targets, and irregular targets, while the segments by application focus on electronics, aerospace, and others. The regional segments are divided into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa, calculating the market size for high purity alloy sputtering targets. It also includes the market share of major companies in high purity alloy sputtering targets, product and business overviews, and sales performance.

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Tin (Sn) target for semiconductors

Tin (Sn) target purity ≧ 4N

In the semiconductor industry, there is a demand for finer and higher-quality wiring. To enhance the reliability of wiring, the purity and conductivity of materials are crucial. Inappropriate materials or manufacturing processes can lead to wire breakage or performance degradation. Our tin (Sn) target contributes to the high quality of semiconductor wiring due to its high purity and excellent conductivity. 【Application Scenarios】 - Wiring formation in semiconductor manufacturing - Production of ITO thin films 【Benefits of Implementation】 - Improved wiring reliability with high-purity materials - Enhanced performance due to excellent conductivity - Increased yield through uniform film formation

  • Other metal materials

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