We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Plasma Processing Equipment.
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Plasma Processing Equipment Product List and Ranking from 42 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Plasma Processing Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. サンワ・エンタープライズ Saitama//Machine elements and parts
  2. null/null
  3. アイオー・エム 本社 Aichi//Trading company/Wholesale
  4. 4 日立ハイテク Tokyo//Industrial Machinery
  5. 5 アクア Kyoto//Research and development equipment and devices
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Plasma Processing Equipment Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Small Pneumatic Equipment | Cylindrical Airflow Generator "Circle Blow" サンワ・エンタープライズ
  2. Handheld Atmospheric Pressure Plasma Treatment Device "Piezo Brush PZ3"
  3. Small Pneumatic Equipment | Air Volume Amplifying Type "Line Blow" (Video Available) サンワ・エンタープライズ
  4. Small Pneumatic Equipment | Air Amplification Air Blow Nozzle "Round Blow" サンワ・エンタープライズ
  5. 4 Shortening the cooling cycle of blow molding! Compressed air cooling device CAC アイオー・エム 本社

Plasma Processing Equipment Product List

61～75 item / All 103 items

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Vacuum device for plasma treatment for parallel plate evaluation

Vacuum device for plasma treatment for parallel plate evaluation

Widely used in fine anisotropic processing such as semiconductor, liquid crystal fine patterning, and DNA chip manufacturing.

You can choose a version that suits your needs, ranging from a manually operated research and development type chamber with atmospheric gates, transport mechanisms, and cassette stations to a fully automated system. We emphasize process reproducibility and standardly equip our systems with chillers for electrode temperature control and APC, and we can add turbo pumps compatible with high vacuum processes. 【Features】 ○ RIE plasma etching equipment ○ Capable of anisotropic etching of silicon wafers up to 6 inches and small square substrates ○ Equipment for 8 and 12 inches can also be designed For more details, please download the catalog or contact us.

  • Plasma surface treatment equipment
  • Vacuum Equipment

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Grinding waste liquid concentration recovery treatment system

Grinding waste liquid concentration recovery treatment system

If you are struggling with high costs for the industrial waste treatment of slurry and back grinder waste liquid, improve efficiency with electronic engineering's waste liquid treatment systems, ranging from small to large machines!

It is possible to reuse the separated permeate liquid from the equipment that collects abrasive particles from waste liquid according to your requirements. Additionally, the absence of heating, such as from heaters, reduces running costs. Maintenance is also easy, allowing for simple cleaning without burdening maintenance personnel. <Features> ★ It concentrates and reduces the volume of polishing waste liquids, such as slurries for semiconductors and back grinders, from a dilution concentration of 1/10 to 1/100. ★ The liquid that has passed through the membrane can be treated to a level equivalent to neutralized wastewater that can be discharged, municipal water, or primary pure water, depending on your requirements. ★ We offer three types of models based on the volume of waste liquid. ★ There are many options available, including automatic cleaning functions that reduce maintenance frequency and remote monitoring. ★ Its compact design allows for installation in existing factories without needing to choose a specific location. ★ It is possible to reduce running costs primarily through pump operation without heating treatment.

  • Other semiconductor manufacturing equipment

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Plasma treatment device (multi-purpose plasma etcher)

Plasma treatment device (multi-purpose plasma etcher)

Plasma processing device (multi-purpose plasma etcher)

This device is a multipurpose single-sheet plasma unit that is effective for etching polyimide-based resins, nitride films, ashing (ash removal) of photoresists, and surface modification, using parallel plate high-frequency plasma. It supports wafer sizes from 50 to 200 mm (2 to 8 inches) and is compatible with BGA, CSP, and other formats. The plasma mode can be switched between DP mode and RIE mode via the operation panel. Additionally, it allows for the retrofitting of a transport unit, making it ideal for experimental and research facilities.

  • Etching Equipment
  • Ashing device
  • Other processing machines

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Luminescence Measurement Device AB-2550 Chronos Dio

Luminescence Measurement Device AB-2550 Chronos Dio

AB-2550 Chronos Dio is a luminescence measurement device (luminometer) that uses a photomultiplier tube as its detector.

A 35mm diameter culture dish is ideal as a sample container for real-time monitoring of gene expression in cultured cells and tissue sections over a period of several hours to several days.

  • Other measurement, recording and measuring instruments
  • Other image-related equipment

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Light Measurement Device AB-2350 PHELIOS

Light Measurement Device AB-2350 PHELIOS

The AB-2350 Ferios is a luminescence measurement device for 384/96 well plates.

Recent developments in various application technologies utilizing bioluminescence and chemiluminescence have led to increased demands for various functions in luminescence measurement devices. The AB-2350 Ferios employs a highly efficient optical system and is a luminescence measurement device specifically designed for microplates, featuring the ability to quantitatively identify multiple luminescent colors. By specializing in luminescence measurement, it minimizes detection loss as much as possible, achieving a significant sensitivity improvement in the measurement of 384-well microtiter plates.

  • Other measurement, recording and measuring instruments
  • Other image-related equipment

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Atmospheric Pressure Plasma Treatment Device 'NJZ-2820'

Atmospheric Pressure Plasma Treatment Device 'NJZ-2820'

An atmospheric pressure plasma treatment device that enables stable plasma treatment at atmospheric pressure! The miniaturization of the device makes it easy to integrate into production lines!

The atmospheric pressure plasma treatment device "NJZ-2820" is an optimal device for integration into production lines and production equipment, thanks to its high-efficiency plasma head. It enables stable plasma treatment at atmospheric pressure and reduces running costs by plasma-activating compressed air. The miniaturization of the device also makes it easy to integrate into production lines. 【Features】 ■ Generates high-density plasma using 2.45GHz microwaves ■ Allows plasma generation only when needed with quick ignition ■ Achieves miniaturization and cost reduction of the device *Please consult us regarding low-temperature plasma (below 70°C) and thermal treatment plasma using oxygen. *For more details, please request documentation or view the PDF data available for download.

  • Plasma Generator
  • Plasma surface treatment equipment
  • High frequency/microwave parts

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Batch-type plasma processing device WPA-600S

Batch-type plasma processing device WPA-600S

A sequencer that is low-cost yet equipped with high performance, capable of managing various assembly conditions and offering excellent cost performance.

We have adopted a compact power matching method, achieving faster plasma matching. By reducing the matching time, we have minimized charge-up damage to the device during plasma ignition. Additionally, we have achieved space-saving design with only the PUMP outside of the main unit.

  • Other inspection equipment and devices

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Plasma treatment device WLP600S

Plasma treatment device WLP600S

Compatible with 6-inch and 8-inch wafers! Plasma processing equipment using a parallel plate method.

The WLP600S is a plasma processing device using a parallel plate method. It supports 6-inch and 8-inch wafers, achieving low cost and space-saving design. The two types of plasma modes, DP (Direct Plasma) mode and RIE (Reactive Ion Etching) mode, can be switched using only the controls on the panel, making it suitable for various applications such as etching polyimide-based resins and surface modification of photoresists. 【Features】 ○ Easy plasma mode switching ○ High-speed responsiveness ○ Space-efficient footprint ○ Compatibility with a wide variety of processes ○ High customization options For more details, please contact us or download the catalog.

  • Plasma surface treatment equipment

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Remote Atmospheric Pressure Plasma Treatment Device

Remote Atmospheric Pressure Plasma Treatment Device

Has numerous achievements in leading companies in Asia.

The plasma generation section and the processing section are completely separated. The processing is carried out using only radical components. ■ Processing Targets Modification of the target work surface (improvement of bonding strength, enhancement of adhesion) Removal of organic substances from the target work surface 【Features】 ■ Reduces damage to the processed film due to chemical processing using only radicals without electron or ion attacks ■ Ideal for processing conductive films and glass after electrode formation ■ Various reaction gases can be used: CDA (Clean Dry Air), N2, O2, Ar, etc. For more details, please contact us.

  • Other physicochemical equipment
  • Plasma surface treatment equipment
  • Plasma Generator

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Plasma treatment device: Proposing surface treatment and smear removal.

Plasma treatment device: Proposing surface treatment and smear removal.

Many achievements with major Asian electronics manufacturers! We propose surface treatment in various fields!

Hitachi High-Technologies Corporation offers plasma equipment with a proven track record among major electronic device manufacturers in Asia. We propose surface treatment solutions in various fields, including desmear equipment suitable for removing smears from small-diameter rigid and flexible printed circuit boards. 【Features】 ■ Desmear Equipment - For removing smears from small-diameter rigid and flexible printed circuit boards Cleaning application: Enhancing hydrophilicity before the plating process of printed circuit boards ■ Vacuum Plasma Cleaner - For removing residues after resist stripping and for pre-treatment before IC bonding ■ Atmospheric Plasma - For removing organic substances, surface modification, and surface roughening of films and glass substrates *For more details, please refer to the PDF materials or feel free to contact us.

  • Plasma surface treatment equipment
  • Other physicochemical equipment

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Inline plasma treatment device

Inline plasma treatment device

High-speed, uniform, double-sided processing for pre-treatment before plating and for pre-treatment before adhering materials such as LCP and PTFE.

The "inline plasma treatment device" can be used for pre-treatment before attaching low transmission loss substrates for high-speed communication, as well as for removing residues from desmear and dry film. It also supports inline transport. <Product Features> 1. High speed and high uniformity for both sides 2. Compatible with automatic transport 3. Uniform cooling within the surface *For more details, please download the PDF or contact us.

  • Other semiconductors

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Batch-type plasma processing device

Batch-type plasma processing device

"High-speed, uniform, double-sided processing" for pre-treatment before plating and for pre-treatment before attaching low transmission loss substrates for high-speed communication.

The "batch-type plasma treatment device" can be used for pre-treatment before adhering materials such as LCP and PTFE, as well as for removing residues from desmear and dry films. It has a proven track record of over 200 units operating in mass production factories around the world. <Product Features> 1. High-speed, highly uniform double-sided treatment 2. Abundant track record 3. Uniform cooling within the surface *For more details, please download the PDF or contact us.

  • Other semiconductors

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Product lineup according to purpose and use.

Product lineup according to purpose and use.

We have prepared items for cleaning joint surfaces! Here are the reasons why PLAZMARK is chosen.

The "PLAZMARK" products we offer are available according to various purposes and applications. We have "cleaning" products for cleaning joint surfaces, as well as "wafer-type" products that allow for easy evaluation of plasma distribution that cannot be assessed through luminescence analysis. Additionally, we offer types such as "atmospheric pressure plasma" that respond to high-speed plasma processing. 【Product Lineup】 ■ Cleaning ■ Wafer-type ■ Atmospheric pressure plasma *For more details, please refer to the related links or feel free to contact us.

  • Plasma Generator
  • Evaluation Board

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High-sensitivity bioluminescence measurement device "CL24A/CL96A (ver.2)"

High-sensitivity bioluminescence measurement device "CL24A/CL96A (ver.2)"

The temperature control/CO2 compatible model has been renewed! A measuring device with significantly reduced condensation.

The high-sensitivity bioluminescence measurement device "CL24A/CL96A (ver.2)" is an ultra-high-sensitivity bioluminescence measurement device equipped with temperature and CO2 gas control functions. It allows for real-time measurement of biological samples while keeping them alive in an environment where temperature and CO2 concentration are controlled, making it ideal for measuring animal-derived cells. Vibrations that can be problematic in the measurement of cultured cells have been minimized to the extreme. It can simultaneously measure up to two standard 24-well plates or 96-well plates. 【Features】 ○ Temperature/CO2 gas control functions are standard ○ Equipped with an ultra-high-sensitivity detector (The CL24A can optionally be equipped with optical filters) ○ The measurement analysis software "Analysis NINJA," which is easy for anyone to operate, is included as standard ○ Vibration reduction, condensation reduction ○ The CL24A can optionally be equipped with a CO2 gas humidification chamber (*Optional at the time of order) For more details, please contact us or download the catalog.

  • Other measurement, recording and measuring instruments

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