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  3. アズサイエンス 松本本社
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アズサイエンス 松本本社

EstablishmentApril 1, 1974
capital6136Ten thousand
number of employees358
addressNagano/Matsumoto-shi/2-3-35 Nishimuraicho
phone0263-58-0021
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last updated:Dec 15, 2023
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アズサイエンス List of Products and Services

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Anisotropic noble metal nanoparticle aqueous dispersion Anisotropic noble metal nanoparticle aqueous dispersion
自動分注装置 自動分注装置
高圧洗浄機 高圧洗浄機
Ultra-low temperature freezer Ultra-low temperature freezer
System System
Clean booth Clean booth
Data logger Data logger
Constant temperature and humidity device Constant temperature and humidity device
Cross-section sample preparation device Cross-section sample preparation device
Electrical measuring instruments Electrical measuring instruments
Data acquisition device Data acquisition device
Measuring instrument Measuring instrument
X-ray inspection device X-ray inspection device
Moisture meter Moisture meter
Solid-phase extraction device Solid-phase extraction device
Microdomain analysis and surface analysis equipment Microdomain analysis and surface analysis equipment
Mass spectrometer Mass spectrometer
Other industrial equipment Other industrial equipment
Material Generation Machine Material Generation Machine
Film formation related equipment Film formation related equipment
Ion beam application device Ion beam application device
Surface treatment and modification equipment Surface treatment and modification equipment
Animal experimentation-related equipment Animal experimentation-related equipment
Testing and inspection equipment Testing and inspection equipment
Environmental measurement equipment Environmental measurement equipment
Physical property measurement instruments Physical property measurement instruments
Cell research equipment Cell research equipment
Structural analysis and elemental analysis equipment Structural analysis and elemental analysis equipment
Microscope and observation device Microscope and observation device
Optical analysis device Optical analysis device
Chromatograph Chromatograph
Material

Material Generation Machine

This is an introduction to the material generation machine.

TP-99140FDR Powder Supply Device

It can accommodate a wide range of particle sizes and supply rates with a single unit.

The powder supply device manufactured by Nippon Denshi Co., Ltd. is a continuous powder metering feeder that transports powder using carrier gas. There is also a model (TP-99260FDR powder supply device) that supports rate control. 〇 Features - Versatility - Fine particle supply - Low rate supply - Minimal carrier gas flow - Supply under reduced pressure - Branch supply *For more details, please refer to the PDF or feel free to contact us.

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TP-99260FDR Powder Supply Device

The automatic control function for powder supply rate has been installed.

The powder supply device TP-99260FDR from Nippon Denshi Co., Ltd. has been newly equipped with an automatic control function for powder supply rates, allowing for more stable powder delivery! External control is also possible. It can quantitatively supply highly cohesive and poorly flowing fine particles of less than a few microns at a specified powder supply rate while being automatically controlled. 〇 Features - Micro supply - Stable supply - Fine powder supply *For more details, please download the PDF or feel free to contact us.

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TP series high-frequency induction thermal plasma device

Due to the absence of electrodes, the raw material components can evaporate or melt as they are.

The TP series high-frequency induction thermal plasma device from Nippon Electronics Corporation generates thermal plasma at approximately 10,000 degrees through high-frequency induction, enabling processes such as spheroidization, nanoparticle synthesis, and thick film synthesis through physical and chemical reactions. 〇 Features - Flash evaporation is possible even with heterogeneous raw materials having different boiling points. - High-purity material synthesis is achievable. - Chemical reactions and modifications such as oxidation, reduction, nitridation, and carbonization are possible. - Raw materials can be sufficiently heated and reacted. *For more details, please feel free to contact us.

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TP-40020NPS High-Frequency Induction Thermal Plasma Nanoparticle Synthesis Device

We have packaged each unit, which was previously separate, into one compact and easy-to-use system.

The TP-40020NPS high-frequency induction thermal plasma nanoparticle synthesis device from Nippon Electronics Corporation utilizes RF thermal plasma in an ultra-high temperature, high purity, and high chemical reaction environment, enabling various material development such as nanoparticle synthesis and the spheroidization and modification of fine particles. It continuously supplies raw materials (powder/gas/liquid) into thermal plasma at approximately 10,000 degrees, performing plasma processing such as evaporation, melting, and chemical reactions. 〇 Features - It is possible to mix gases such as oxygen, hydrogen, and nitrogen into the argon-dominated thermal plasma, allowing for chemical reactions and modifications such as oxidation, reduction, and nitriding. - Due to the ultra-high temperature, it can instantaneously flash-evaporate different raw materials with varying boiling points, enabling the synthesis of multi-component nanoparticles. - High-purity material synthesis can be performed in a contamination-free environment without consumable electrodes. *For more details, please download the PDF or feel free to contact us.

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JEBG series straight beam electron gun and power supply

The electron beam can scan a wide area at high speed.

The JEBG series linear electron gun and power supply from Nippon Electronics Corporation is a high-output electron beam source designed for the deposition or melting of metals and oxides in a vacuum. It enables high-rate film formation on continuously running wide long films or large-area glass substrates. Additionally, it is used for the production and refining of ingots of high-melting-point metals for electron beam melting. 〇 Features - Capable of high-speed scanning over a wide range - Can create various beam irradiation patterns and areas - Control of melting surface and film thickness distribution is possible *For more details, please download the PDF or feel free to contact us.

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