アズサイエンス List of Products and Services

The BS series electron beam evaporation system from Nippon Electronics Corporation is an evaporation device suitable for research and development as well as small-scale production. It can be equipped with various optional devices, and the chamber shape and load lock can be customized according to your requirements. 〇 Features - The evaporation sources can be selected from electron beam evaporation sources (electron guns), bombardment evaporation sources, and resistance heating evaporation sources, allowing for multiple units to be combined as desired. - Low-temperature and low-damage evaporation is possible with an electron gun plus a reflective electron trap, or through bombardment evaporation, making it particularly effective for lift-off evaporation using resist. - Stable evaporation of aluminum is achievable, and reusable liners are also provided. *For more details, please download the PDF or feel free to contact us.

The BS-60610BDS Bombard deposition source from Nippon Electronics Corporation is a vacuum deposition source that utilizes the electron beam bombardment indirect heating method. By adding a beam scan function to the conventional model (BS-60310BDS), features such as high rate capability, thick film deposition, and compatibility with large equipment are achieved. 〇Features - Increased liner capacity. - High rate capability. - Compatibility with large equipment. - Thick film capability. Also suitable for infrared applications. - Rate stabilization. - Low damage, low defects, low absorption. *For more details, please download the PDF or feel free to contact us.

Japan Electronics Corporation BS-60310BDS Bombard Evaporation Source An electron beam is irradiated onto the back surface of a liner filled with evaporation material, heating the liner through electron impact (bombardment). The evaporation material is not directly exposed to the electron beam. 〇Features - Indirect heating method - No damage from reflected electrons or X-rays during film formation - Splash is suppressed, allowing for low-defect film formation - No decomposition or compositional deviation - Low optical absorption - Stable film formation possible *For more details, please download the PDF or feel free to contact us.*

The electron guns of the BS/JEBG/EBG series from Nippon Electronics Corporation are electron beam evaporation guns (deflection type) used for the formation of various thin films, such as optical thin films and electrode films. 〇Features - By directly irradiating the evaporation material with an electron beam for heating, it achieves high thermal efficiency, allowing for the evaporation of various materials, including high melting point metals, oxides, compounds, and sublimable substances. - Since the evaporation material inside the water-cooled copper crucible is directly heated, there is no reaction with the boat or crucible as seen in resistance heating or induction heating methods. * Haas liners may also be used. - It allows for high-speed output control, enabling precise control of film thickness. * For more details, please download the PDF or feel free to contact us.

The BS-80020CPPS plasma source from Nippon Electronics Corporation is a plasma source designed for low-temperature processes that suppresses the temperature rise of substrates and materials while enhancing the ion irradiation energy to the substrates/materials. It is suitable for film formation applications on plastics and organic films (plasma-assisted deposition) as well as for surface modification applications. 〇 Features - Good adhesion even without heated film formation - High-density thin films are formed - Can be retrofitted to existing vacuum chambers *For more details, please download the PDF or feel free to contact us.

The BS-80011BPG built-in plasma gun from Nippon Electronics Corporation is a plasma source designed to generate high-density plasma when installed in a vacuum chamber. By combining it with vacuum deposition, the plasma-assisted deposition (ion plating) method can enhance the film properties of optical thin films, protective films, and functional films. It is also effective for substrate cleaning and surface modification. 〇 Features - High-density direct current plasma with low voltage and high current efficiently ionizes gas molecules and evaporated particles. - Reactive deposition is possible. - High-rate film formation is achievable over large areas. - Can be mounted on vacuum systems with various layouts. *For more details, please download the PDF or feel free to contact us.

This is a multipoint sensor connected to the crystal oscillator type film thickness controller/monitor of Nippon Electronics Corporation, used to measure/control film thickness and deposition rate during vacuum deposition. You can select and combine the length of the vacuum chamber, sensor head type, and the number of crystal oscillators (crystals). 〇 Features - Detection holes are in fixed positions - Can accommodate 6 or 12 crystal oscillators *For more details, please download the PDF or feel free to contact us.