プレテック　静岡製作所 List of Products and Services

The "Fine Jet" is a cleaning unit that allows for the selection of various frequencies. It meets a wide range of needs for single wafer cleaning with stable oscillation from low to high output. It is suitable for various applications such as cleaning wafer substrates, magnetic disks, and post-CMP cleaning of wafers. Additionally, there are various nozzle options available, including chemical resistance and metal contamination-free types. 【Features】 ■ Fine output adjustment: Stable output adjustment in 1W increments (PT-010J50) ■ Selection of various frequencies available (400kHz/1500kHz/3000kHz) ■ Variety of nozzle options: Chemical resistance, metal contamination-free ■ Enhanced detection function: Capable of detecting transducer degradation (PT-010J50) ■ Enhanced communication function: Monitoring of oscillator status and external settings (PT-010J50) *For more details, please download the PDF or feel free to contact us.

"Fine Score" is a cleaning unit suitable for FPD substrate cleaning and various wafer substrate cleaning. The cleaning width ranges from 160mm to 2210mm, offering a detailed size variation. Additionally, the maximum output increase contributes to the expansion of the cleaning area and cost reduction. Please feel free to contact us if you have any inquiries. 【Features】 ■ Detailed size variation ■ Cleaning width ranges from 160mm to 2210mm ■ Fine output adjustment: stable output adjustment in 1W increments (PT-150MV) ■ Maximum output increase: expansion of the cleaning area and cost reduction ■ Communication functions: monitoring of oscillator status, external settings ■ Compliance with various standards (FCC, CE, RoHS) *For more details, please download the PDF or feel free to contact us.

"Fine Sonic" is a cleaning unit that achieves uniform sound pressure. It allows for stable output adjustment in 1W increments. It is suitable for cleaning various types of wafer substrates, photomasks, magnetic disks, and more. Additionally, it contributes to the expansion of the cleaning area with maximum output increase. Please feel free to contact us when you need assistance. 【Features】 ■ Achieves uniform sound pressure ■ Various frequencies available for selection [750kHz/(1000kHz)/(1500kHz)/2000kHz] ■ Fine output adjustment: stable output adjustment in 1W increments ■ Maximum output increase: expansion of the cleaning area ■ Communication function: monitoring of oscillator status, external settings (PT-150MV) ■ Compliance with various standards (FCC, CE, RoHS) *For more details, please download the PDF or feel free to contact us.

We offer the "Fine Series Cleaning Units," including a batch cleaning unit that uses 750kHz. The "Fine Sonic (Batch Cleaning Unit)" efficiently transmits sound waves through a specially designed vibrating element, removing sub-micron particles without damaging the workpiece. Additionally, we provide the "Fine Jet (Spray Cleaning Tool)," suitable for cleaning silicon wafers and photomasks, as well as the "Fine Scall (Shower Cleaning Tool)," which sprays ultra-pure water infused with 1.5MHz sound waves for cleaning. 【Features】 < Fine Sonic > ■ Batch cleaning unit using 750kHz ■ Efficiently transmits sound waves through a specially designed vibrating element, removing sub-micron particles without damaging the workpiece ■ Suitable for cleaning silicon wafers, photomasks, and magnetic disks *For more details, please refer to the related links or feel free to contact us.

The "Proximity Type Megasonic PA10-Q60AE-S" is a cleaning unit that emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. It enables high linearity oscillation from a low output range. Since it cleans very close to the substrate, it can remove sub-micron particles. It allows for liquid supply with a cavitation prevention function and enables a sweeping motion on the substrate, achieving highly reproducible cleaning across the entire substrate. 【Features】 ■ The nozzle material is quartz, which has low particle generation and is durable against chemical solutions. ■ Emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. ■ Enables high linearity oscillation from a low output range. ■ Cleans very close to the substrate, allowing for the removal of sub-micron particles. *For more details, please download the PDF or feel free to contact us.

Our company offers "Ultrasonic Cleaning Units" that support various precision cleaning applications using advanced ultrasonic technology. The ultrasonic oscillator employs high-performance transistors, allowing for the selection of output and frequency suitable for specific applications, known as "Ultrasonic." Additionally, we provide "Sweep Sonic," which continuously varies the wavelength of standing waves generated by ultrasound to completely clear the intensity of ultrasonic energy. Please contact us for inquiries. 【Ultrasonic Features】 ■ Removes particles through cavitation generated by liquid resonance of ultrasound ■ The ultrasonic oscillator uses high-performance transistors, allowing for the selection of output and frequency suitable for specific applications ■ Effective for removing particles larger than 1μ from silicon wafers, magnetic disks, lenses, cassettes (carriers), etc. *For more details, please refer to the related links or feel free to contact us.