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XPump is a cutting-edge AI/ML-based solution that monitors the pump's status in real-time and performs predictive maintenance. It continuously monitors critical parameters such as vibration, temperature, and voltage, providing early warnings to prevent failures. XPump seamlessly integrates with existing systems, improving operational efficiency and reducing downtime and maintenance costs.
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Free membership registrationExisting equipment can be equipped with SECS/GEMS functionality! End users: Are there any devices that cannot be equipped with SECS/GEM functionality due to high costs or difficulty in finding compatible vendors? Equipment manufacturers: Wouldn't it be great if you could provide SECS/GEMS functionality without changing existing software or hardware? EIGEMBox solves these problems!! Moreover, there is no need to modify the hardware or software of the equipment!
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Free membership registrationHigh flexibility and precise process control This product is an automatic wet processing system for 200mm or 300mm wafers that can be used with or without carriers, designed for accurate process monitoring, high productivity, and flexibility. RENA's Semi Processing Platform offers the flexibility to be adjusted according to customer requirements, delivering maximum production quality and manufacturability. Notably, it features a flexible carrierless handling system that allows for simultaneous processing of wafers with varying thicknesses.
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Free membership registration■ Achieve a stable process for mass production base process development ■ Highly flexible software enabling the shortest process development ■ Equipped with two tanks as standard specifications to support diverse processes ■ Excellent uniformity even at an etching rate of 100 Å/Sec ■ Transport system supports both manual and automatic operation ■ Initial investment is minimized ■ Space-saving ■ Suitable for small lot production ■ Processes for acids and solvents ■ A complex transport system that cannot be achieved with a spinner ■ Etching uniformity surpasses that of batch types ■ Up to 2 to 4 tanks can be installed ■ Compatible with 200mm wafers ■ Up to two movable spray arms can be installed for individual chemical systems ■ Bottom spray nozzles prepared for both pure water and N2 ■ Various chemicals supplied from the outside to the rear of the unit, controlling particles with high-speed cooling etching using spin drying
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Free membership registrationThe RENA multi-step wet processor, Revolution, employs a rotary robot design and precision engineering, enhancing the operability of process control. It features a powerful and flexible design while being space-saving. The Advancer series is a semi-automatic wet processor with modular and easy-to-install robotic transport. 【Space-saving Rotary Robot】 ■ 2-5 positions, 2-axis design ■ Multiple process tanks can be installed ■ Compatible with 150-300mm wafers ■ Tank cover (optional) ■ Pressure or optical tank level monitoring 【Others】 ■ Versatile applications for etching, stripping, and cleaning ■ Easy-to-understand recipe structure ■ Options for chemical addition, injection, and filling ■ Acid and dissolution models ■ Up to five tanks can be installed ■ Marangoni drying can be integrated 【Dedicated Software IDX Flexware for Yield Improvement】 ■ High flexibility ■ High degree of freedom ■ Accuracy ■ SECS/GEM compliant ■ Touch screen UI ■ Simultaneous processing of multiple lots and recipes
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Free membership registrationThe Advancer series is a semi-automatic wet processor for robotic transport that is modular and easy to install. 【Productivity】 High performance at a low cost ■ Front and rear side-mounted robots ■ Large chemical solution capacity ■ Chemical solution input and mixing in the tank ■ Quick rinsing 【Productivity】 Various models for optimal performance ■ Diverse applications such as cleaning, etching, and stripping ■ Three types of platforms available with 1-6 tanks ■ Acid and solvent processes ■ Up to two robots can be optionally mounted ■ Compatible with 4, 5, 6, and 8 inches 【IDX Flexware】 ■ Flexibility ■ Scalability ■ Precision ■ SECS/GEMS compliant ■ Touch screen
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Free membership registrationRENA NA has created a new SRD with current technology. The SRD was a neglected presence in the cutting-edge device industry. RENA's COMPASS has brilliantly overturned that. By focusing on the weaknesses of the SRD that had been left unattended for decades, RENA's COMPASS has made the SRD more user-friendly. Featuring the proven IDX software, COMPASS has integrated the SRD into factory automation.
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Free membership registrationThis device is compatible with 4, 5, 6, and 8-inch wafers and is designed to form silicon oxide and silicon nitride films on the wafers using the plasma CVD method. The basic configuration consists of three modules: a process module, an RF generator module (one set each for high frequency and low frequency), and a vacuum pump module.
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Free membership registration【Equipment Modification】 ■ Sale of refurbished used equipment ■ Modification for small diameter and compound wafers ■ SMIF to open cassette modification ■ Modification for multiple wafer types (using tray) 【Regular Maintenance】 ■ Chip replacement 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
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Free membership registrationThe FPA3000 series, which is an i-line stepper, has a proven track record as a standard silicon wafer production machine, and it is highly regarded for its ability to handle the characteristics of compound wafers, such as warping and weight, making it widely supported in that field. Our company is committed to maintaining appropriate inventory levels and has established a demo environment equipped with a developer, microscope, and CDSEM. 【Equipment Modification】 ■ Sale of refurbished used equipment ■ Wafer size change ■ Reticle size change ■ Change of reticle changer type ■ Chamber refrigerant modification 【Parts Sales】 【Parts Repair】 ■ Repair of circuit boards 【Regular Maintenance】 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
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Free membership registrationThere is a strong demand for mirror projection exposure machines that can perform batch exposure without damaging masks. This machine has contributed to the production of MEMS, such as transistors and power semiconductors, for many years with its compact footprint and low maintenance costs. It continues to tackle challenges related to degradation over time, such as reduced illuminance and deterioration of resolution and uniformity, through unique technologies like mirror regeneration. 【Equipment Modification】 ■ Sale of refurbished used equipment ■ Change of substrate size ■ Chamber refrigerant modification ■ Mirror regeneration 【Parts Sales】 【Pickup Overhaul】 【Regular Maintenance】 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
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Free membership registrationISO/IEC 17025 TAF standards Using manufacturer-certified calibration jigs Rich domestic track record If you are having trouble with failures, repairs, or calibrations, please feel free to consult us!
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Free membership registration【Device Sales】 ■ DAGE4000 ■ DAGE5000 【Specifications】 ■ BS5KG ■ BS250R ■ CBP/TP5KG ■ WP100 ■ WP1KG ■ DS100 ■ Other Load Cells 【Regular Maintenance】 ■ Calibration of Various Load Cells 【Purchase Service】 ■ DAGE4000 ■ DAGE4000plus ■ DAGE4000HS ■ STELLAR4000
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Free membership registrationThe sensors are highly reliable and are placed directly on the measured wafer, allowing them to provide the actual temperature at the exact location where they are positioned. They can also accurately measure the temperature profile of the wafer and continuously monitor the temperature changes throughout the complete thermal cycle, including transient states such as ramping up, cooling down, and delay periods.
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Free membership registrationThis is a fully automatic RTP device with a single chamber that supports 4 to 8-inch wafers. The transport method can be selected between open cassette and SMIF, with two cassette stations available. The wafers are stored in a susceptor for processing, achieving excellent Rc and temperature uniformity regardless of wafer characteristics such as warping, thickness, and transmittance. The heat source is a halogen lamp, arranged on both the top and bottom sides. The temperature measurement range is from 20°C to 1250°C. Thermocouples and pyrometers perform real-time temperature measurements, and the results are controlled by a smart PID and multi-zone SCR, enabling superior temperature control. The vacuum chamber is equipped with an oxygen concentration monitor to support the maintenance of an oxygen-free environment. The Windows-based software is multilingual and allows intuitive operation through a graphical user interface. With a track record of over 500 units shipped, we leverage our process profiling expertise and provide assistance in solving challenges in your process development with a demo environment that is always prepared with five units.
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