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  3. 神港精機 東京支店
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神港精機 東京支店

EstablishmentJanuary 24, 1949
capital10000Ten thousand
number of employees180
addressTokyo/Chuo-ku/2nd Floor, Kusunoki Nihonbashi Building, 4-2-16 Nihonbashi Muromachi
phone03-3271-2156
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last updated:Nov 13, 2025
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神港精機 Product Lineup

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Vacuum pump components Vacuum pump components
Vacuum device Vacuum device
Hard film formation device Hard film formation device
Assembly device Assembly device
Plasma treatment device Plasma treatment device
Thin film formation device Thin film formation device
Assembly

Assembly device

It is an assembly device that meets a wide range of needs.

Vacuum soldering device (vacuum reflow device)

The standard vacuum reflow device with the number one domestic track record! <Sample tests now accepting applications>

By melting solder in a vacuum, voids within the solder are eliminated. Additionally, by preheating in a hydrogen atmosphere or formic acid atmosphere, flux-free soldering is achieved. We take pride in being the number one in domestic achievements as a standard machine in the power device manufacturing process. With a wide range of options and a rich lineup of equipment, we propose the optimal device for our customers. <Recipient of the Excellence Award at the 2nd Monozukuri Japan Awards>

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Vacuum heat treatment device (hot plate type)

A compact heat treatment device characterized by rapid temperature rise and fall. It is an ideal compact vacuum heat treatment device for low-temperature heat treatment such as drying, degassing, and baking of organic substrates.

Application of the basic configuration of a vacuum soldering device with a proven track record. High-speed heat treatment using a heated plate for soldering. Degassing and drying of high-density mounting substrates and printed boards before film formation. Ideal for various applications such as drying ceramic materials. Effective for low-temperature baking of solar cell cells and annealing of thin films, also compatible with inline processes.

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Horizontal hydrogen annealing device (variable atmosphere heat treatment device)

Supports small-diameter wafers (4 inches) and niche processes for compound semiconductors. Compatible with both crystal processes and wafer processes (alloying and electrode annealing).

A dedicated annealing device designed for special applications such as epitaxial layers of compound semiconductors and the annealing of polished Si wafers. After high vacuum evacuation, the atmosphere is replaced with hydrogen up to atmospheric pressure, allowing for uniform heating at high temperatures (1000°C) in a high-purity reducing atmosphere.

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Hydrogen atmosphere conveyor furnace (reduction atmosphere continuous heat treatment device)

A bestselling type with a wealth of achievements, supporting high-temperature soldering, paste sintering, and metal particle sintering processes with reliable software and highly dependable hardware.

Replacement of the atmosphere in the furnace with hydrogen reduction. Achieving low oxygen concentration and reduction atmosphere treatment that cannot be realized with an inert atmosphere using N2 through continuous processing in a conveyor furnace. Utilizing the reduction effect of the hydrogen atmosphere, it supports high-temperature soldering and continuous reduction atmosphere heat treatment that require high reliability, which cannot be addressed by conventional reflow. There is also a wealth of experience in firing various pastes. The system covers the reflow process for wafer bumps of system LSI with a CtC type compatible with 300 mm wafers. In addition to conventional soldering, brazing, and paste firing processes, it also has a proven track record in sintering bonding for next-generation bonding materials (metal nano-paste). A demonstration machine is permanently available to reliably support initial tests for various applications through to mass production.

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Vacuum soldering device (vacuum reflow device)

Exhibiting at Internepcon! Introducing new products that accommodate large-scale products. <Sample testing now available>

The vacuum soldering device removes voids in the solder by melting the solder in a vacuum. By performing preheating in a hydrogen atmosphere or formic acid atmosphere, it achieves flux-free soldering. It boasts the number one domestic track record as a standard machine in the power device manufacturing process. With the adoption of an upper lamp heater specification, it can accommodate large products and irregular substrates, including heavy items. [Exhibition Information] We will exhibit at Internepcon 2023. A panel of this device and samples of large products will be displayed. (Exhibition dates: January 25 (Wed) to January 27 (Fri) at Tokyo Big Sight, Booth Number: East Hall 1, 2-34) *For detailed specifications, please download the PDF. Feel free to contact us.

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[Sintering Material Compatible] Vacuum and Reduction Sintering Furnace <Maximum 615×615mm>

Large substrate-compatible vacuum and reducing atmosphere sintering furnace │ Capable of multi-purpose processing such as soldering, sintering bonding, and Cu via firing.

A large substrate-compatible model has been introduced for our vacuum reflow device, which boasts the industry's No. 1 track record! It can be utilized not only for conventional soldering but also for sintering bonding, via firing, and other multipurpose processing. For sintered material compatibility, gas introduction is possible without initial vacuum evacuation. It supports sizes up to 615×615mm while achieving the same temperature distribution performance within the substrate as previous models. We also accommodate various customizations. Please feel free to contact us.

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