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  4. Notice of Participation in Ceatec Japan 2018
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  • Sep 21, 2018
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Sep 21, 2018

Notice of Participation in Ceatec Japan 2018

テクニスコ テクニスコ
This time, Technisco will be exhibiting at "CEATEC JAPAN 2018," which will be held at Makuhari Messe from October 16, 2018. [Booth Number] Small Package H023, Hall 5 (near the entrance) Electronic Components/Devices Zone *We sincerely look forward to your visit.
Date and time Tuesday, Oct 16, 2018 ~ Friday, Oct 19, 2018
10:00 AM ~ 05:00 PM
Capital Makuhari Messe 2-1 Nakase, Mihama Ward, Chiba City, TEL 043-296-0001
Entry fee Free
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"Zaguri bottom surface transparent processing" *Materials provided*

For bio-medical glass products. High transparency allows for clear observation. Exhibition participation.

Our company is engaged in the development and manufacturing of products using composite processing technology that combines techniques such as cutting, grinding, polishing, metallizing, and bonding. Among these, the "Undercut Bottom Transparent Processing" can finish the undercut bottom surfaces of glass materials such as Pyrex, Tempax, and quartz to a mirror-like state. The improvement in transparency allows for clearer observation from the outside, making it useful in fields such as bio and medical applications. 【Features】 ■ Metallization on side walls prevents light interference and absorption ■ Hole diameter, hole shape, and undercut depth can be freely set ■ Compatible with wafers up to φ200mm ■ Glass thickness can be set from 0.1 to 0.15mm to match the focal length of liquid immersion lenses *We are currently offering materials introducing our microfabrication technology! You can view more details from the 【PDF Download】. ★ We will be exhibiting at "CEATEC JAPAN 2018" ★

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Cross-edge microfabrication [glass processing] cavity/cap glass

The window section can be made thinner and more transparent. It is suitable for applications such as the transmission of laser light or LED light and observation with immersion microscopy through the window section.

High-precision cavities are formed inside the glass substrate. The window section can be made thin and transparent, allowing laser light and LED light to pass through without distortion, making it suitable for applications such as observation with an immersion microscope through the window. By shielding the glass sidewalls, unnecessary light can also be blocked. By implementing three-dimensional wiring from the bottom to the top of the glass, reliability can be improved while maintaining transparency. This also allows for a review of the assembly process, leading to space-saving solutions. 【Features】 - Transparent processing of the cavity bottom is possible - Metallization on the sidewalls is possible - Three-dimensional wiring shapes are possible *For more details, please contact us or download the catalog.

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Cross-edge microfabrication

Combining multiple processes to develop innovative products! We propose solutions that match your needs.

"Cross-edge microfabrication" refers to a processing method that combines two or more different types of processing within the manufacturing of a single product. The five core processing techniques are "cutting, grinding, polishing, metallizing, and joining." At our company, we propose solutions that match our customers' needs by considering "quality, cost, and mass production" through composite processing technology that crosses these five advanced techniques. [Features] ■ Maintains stable quality ■ Achieves processing with short lead times ■ Provides cost-effective services ■ Solves customer challenges by developing innovative products through the combination of multiple processes *For more details, please refer to the PDF document or feel free to contact us.

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Cross-edge microfabrication [Glass through-hole wiring board (TGV)]

Three-dimensional wafer-level packaging (WLP) is suitable for miniaturizing semiconductors. Through-silicon vias enable improvements in high-frequency characteristics.

This product features numerous electrically conductive metal via-holes formed within borosilicate glass substrates such as Pyrex and Tempax. It can accommodate substrates up to a maximum diameter of 8 inches. It has good flatness and airtightness, making it suitable for anodic bonding for sealing silicon-based devices. 【Features】 ○ Capable of anodic bonding with silicon wafers Solves outgassing issues by enabling anodic bonding without the use of adhesives. ○ Excellent high-frequency characteristics - Ensures low stray inductance and low electrical resistance of vias. - Achieves high insulation compared to silicon by using glass as the base material. ○ Designed to function as a heat sink - Allows the vias to serve as thermal vias by incorporating silicon. ○ Transmits visible light - Enables confirmation of bonding points and transmission of optical signals. ○ Compatible with wafers up to Φ200mm. *For more details, please download the catalog or contact us.

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Cross-edge microfabrication [glass substrate products] spacer glass

Ideal for multilayer structure implementation combined with semiconductor substrates, including MEMS.

"Spacer glass" is processed using glass chipping-free processing technology. In hard glass substrates such as borosilicate glass, chipping of several tens of micrometers can easily occur on the processing surface during notching or hole processing, which poses a significant quality issue. By using Technisco's chipping-free processing technology, it is possible to keep the chipping level below 10 micrometers when using glass substrates as WLP (Wafer Level Packaging) along with semiconductor substrates, or when dicing at the device level. Furthermore, post-processing can eliminate chipping. [Features] - Suppression of flaring around holes - Reduction of chipping - Capable of handling chipping down to ≦10μm - Removal of microcracks generated during glass processing, controlling particles - Reduces operational failures caused by particles after bonding with MEMS devices *For more details, please download the catalog or contact us.

  • Glass

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Cross-edge microfabrication [glass substrate products] small-diameter hole glass

It can achieve anodic bonding without using adhesive, solving the outgassing problem. Compatible with wafer-level packaging (WLP).

"Small diameter hole glass" is processed using glass chipping-free processing technology. In hard glass substrates such as borosilicate glass, chipping of several tens of micrometers can easily occur on the processing surface during groove or hole processing, which poses a significant quality issue. By using Technisco's chipping-free processing technology, it is possible to keep the chipping level below 10 micrometers when using glass substrates as WLP (wafer-level packaging) along with semiconductor substrates or when dicing at the device level. Furthermore, it is possible to eliminate chipping through post-processing. 【Features】 ○ Small diameter hole processing ・Achieves a minimum diameter of 0.1 mm ○ Compatible with wafers up to 300 mm in diameter (For some processing, compatibility is up to 200 mm) ○ Suppresses burrs around the hole area ○ Reduces chipping ・Can accommodate chipping levels of ≤10 μm *For more details, please download the catalog or contact us.

  • Glass

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Glass special microfabrication Glass microchannels (minimum 50 μm)

Glass alone without the use of organic substances such as adhesives. Sharp edge shapes can be achieved.

Glass microchannels (minimum 50μm) can be produced using borosilicate glass and quartz glass. The bottom surface is transparent, and sharp edge shapes can be achieved. Furthermore, since it is made solely of glass without the use of any organic materials such as adhesives, it excels in transparency, chemical resistance, and heat resistance. 【Main Features】 - Can be produced using borosilicate glass and quartz glass - The bottom surface is transparent, and sharp edge shapes can be achieved - Made solely of glass without the use of any organic materials such as adhesives - Excellent transparency, chemical resistance, and heat resistance For more details, please download the catalog or contact us.

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Cross-edge microfabrication [glass substrate products] mesh glass

Achieved square holes without R, which was "impossible" with conventional processing technology. Also capable of small diameters and narrow pitches.

Multiple through holes of 0.2mm square were processed into 0.5t Pyrex glass, creating a mesh-like structure. This processing technology was developed for mass production and can accommodate various quantities. 【Features】 ○ Numerous through holes processed at 0.1mm × 0.1mm ・ (Example) 150,000 holes on a 3-inch wafer ○ Selection of through hole shapes possible with a high aspect ratio (1:8 to 10) ・ Supports straight and tapered shapes ○ Achieves chip-on-glass ・ Improved contact performance during anodic bonding with Si *For more details, please download the catalog or contact us.

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Cross-edge microfabrication [glass microfabrication]

Glass processing with excellent transparency, chemical resistance, and heat resistance.

Our company offers glass processing that excels in transparency, chemical resistance, and heat resistance. The glass we recommend includes high-transparency quartz glass, Tempax glass, and others. 【Features】 ◎ Ultra-thin polishing possible from 0.1 to 0.15 mm → Enables observation of previously unobservable cells, proteins, DNA, etc. ◎ Enables analyses and liquid delivery to microchannels that were previously impossible 【PDMS (silicone resin)】 ◎ Anodic bonding (adhesive-free) with Si (silicon) is possible 【Tempax glass】 → No concerns about adverse effects on cells, etc., caused by adhesives ◎ Capable of producing microchannel products with groove widths of 30 to 50 μm, high aspect ratio channel products (width 100 μm, depth 800 μm), and channel products with vias (which allow for electrical control through electrophoresis by embedding vias) 【Channel products】   \Please make use of the wonderful properties of glass in your bioanalysis and research/ *For more details, please contact us or download the catalog (PDF).

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2026/01/23 ◆ Engineering Artificial Intelligence Seminar

  • NEW
  • SEMINAR_EVENT

Introduction to Artificial Intelligence Application Development Led by Element Technologists Basics of Deep Neural Network Models and MT Systems, Minimization of Training Data, Development Implementation Procedures ~ Learning AI Application Know-How through "Automation of Development, Virtual Inspection, and Detection of Unknown Anomalies" ~ 【AI Construction Demo Included, Excel Materials on AI Construction and Calculation Methods Provided to Interested Parties】 ------------------------------------------------------------ https://johokiko.co.jp/seminar_chemical/AD260103.php ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ We will inform you about upcoming technical seminars with discounted participation fees. If you would like to apply for each seminar with a discount, please contact ikuma.fukui@wmjplab.com. * The discount on participation fees is available to anyone. * However, we do not accept applications from technical consultants or instructors. * If you wish to have an in-house training session for the same seminar, please contact me directly. ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━

Jan 09, 2026

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February 20, 2026 ◆ Loss Function (JIS Z 8403) Seminar

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Method for determining inspection standards, standard values, and safety factors based on economic risks Practical introduction to a method for preventing profit and loss that does not rely on statistical distribution (loss function) [With PC exercises (using templates that can also be repurposed for in-house issue discussions)] ------------------------------------------------------------ https://www.science-t.com/seminar/B260220.html ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ We will inform you about upcoming technical seminars with discounts on participation fees. If you would like to apply for each seminar with a discount on the participation fee, please contact ikuma.fukui@wmjplab.com. * The discount on the participation fee is available to anyone. * However, we do not accept applications from technical consultants or instructors. * If you wish to have the same seminar as an in-house training, please contact me directly. ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━

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February 27, 2026 ◆ Half-Day Intensive Course ◆ MT System (MT Method) Engineering Artificial Intelligence Seminar

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Artificial Intelligence Suitable for Detecting Unknown Defects and Abnormalities through Inspection, Sensing, and Monitoring ~ Introduction to the Basics and Applications of MT Systems (MT Method) ~ [Half-Day Intensive Seminar] [AI Construction and Calculation Method Excel Materials Provided for Interested Participants] ------------------------------------------------------------ https://www.rdsc.co.jp/seminar/260207 ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ We will inform you about upcoming technical seminars with discounted participation fees. If you would like to apply for each seminar with a discount, please contact ikuma.fukui@wmjplab.com. * The discount is available to anyone. * However, we do not accept participants who are technical consultants or instructors. * If you wish to have this seminar as an in-house training, please contact me directly. ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━

Jan 09, 2026

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March 6, 2026 ◆ Quality Engineering (Taguchi Method) Parameter Design Seminar

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Robust Optimization Development Method to Solve the Four Major Challenges in Technology and Product Development: A Practical Introduction ~ Learning through Comparison with Conventional Development Methods and Experimental Design Methods [Quality Engineering Parameter Design] ~ [Software and Discussion Template Available for Interested Parties] ------------------------------------------------------------ https://www.rdsc.co.jp/seminar/260316 ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ We will inform you about upcoming technical seminars with discounted participation fees. If you would like to apply for each seminar with a discount, please contact ikuma.fukui@wmjplab.com. * The discount on participation fees is available to anyone. * However, we do not accept participation from technical consultants or instructors. * If you wish to have this seminar as an in-house training, please contact me directly. ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━

Jan 09, 2026

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2026/01/23 ◆ Engineering Artificial Intelligence Seminar

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  • SEMINAR_EVENT

Introduction to AI Application Development Led by Element Technology Developers Basics of Deep Neural Network Models and MT Systems, Minimization of Learning Data, Development Implementation Procedures ~ Learning AI Application Know-How through "Automation of Development, Virtual Inspection, and Detection of Unknown Anomalies" ~ 【AI Construction Demo Included, Excel Materials on AI Construction and Calculation Methods Available for Interested Parties】 -------------------------------------------------- https://johokiko.co.jp/seminar_chemical/AD260103.php ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ We will inform you about upcoming technical seminars with discounts on participation fees. If you would like to apply for each seminar with a discount on the participation fee, please contact ikuma.fukui@wmjplab.com. * The discount on participation fees is available to anyone. * However, we do not accept applications from technical consultants or instructors. * If you wish to have an in-house training session for the same seminar, please contact me directly. ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━

Jan 09, 2026

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