Supports 300mm wafer process.
Mass flow controller that achieves high precision and fast response over a wide range.
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basic information
**Features** ■ Manufacturer: Hitachi Metals, Ltd. ■ Specifications: Accuracy ±0.5%, Response time within 1.5 seconds (±2% of set value, 0.7 to 1.2 seconds typ) ■ Gas type: To be specified at the time of order ■ Flow range: Full scale, to be specified at the time of order, 10 SCCM to 30 SLM ■ Body material: SUS316L, special electropolished interior ■ Fitting size: 1/4 UJR type, compatible with various IGS ■ Rubber seal and SFC1480FRC/RO without electropolishing are also available □ For other functions and details, please contact us.
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Company information
We provide equipment ranging from high-pressure gas (generally 15MPa: 150kg/cm²) to ultra-high vacuum regions (1x10⁻⁹Pa: 1x10⁻¹¹TORR), including both standard and custom products. Additionally, we can offer environments from high-temperature regions (2300°C) to ultra-low temperature regions (-270°C) as part of our equipment. Specifically, we can design and manufacture high-temperature vacuum heat treatment furnaces and vacuum low-temperature experimental devices upon consultation. Of course, we also provide utility piping for various equipment, as well as gases for the atmosphere and process gases. Please feel free to consult us with any inquiries.
