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  1. Home
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  5. Flow Control
  6. High-pressure general-purpose analog mass flow controller 5850E

High-pressure general-purpose analog mass flow controller 5850E

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5850E

last updated:Jun 11, 2019

川口液化ケミカル 川口事業所
川口液化ケミカル 川口事業所
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Supports all processes including semiconductor wafer processes, LCD processes, optical fiber processes, and general research applications.

An analog mass flow controller that thoroughly pursues cost performance.

    Flow Control
6.jpg

High-pressure general-purpose analog mass flow controller 5850E

6.jpg
6.jpg

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basic information

**Features** - Ideal for general gas lines - Manufacturer: Brooks Instrument Co., Ltd. - Specifications: Accuracy ±1% F.S. Response time within 3 seconds (reaching ±2% F.S.) - Gas type: Specify at the time of order - Flow range: Full scale from 30 mL/min to 30 L/min, specify at the time of order - Full scale models 5851Em for 10-100 L/min - Model 5853E for 100-1,000 L/min is also available - Maximum pressure: 10 MPa - Body material: SUS316L, Viton - Fitting sizes: - Sizes: 1/8, 1/4, Types: SWL, VCR type - Input/output signal: 0-5 VDC For other functions and details, please contact us.

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Applications/Examples of results

【Applications】 ■ Semiconductor wafer process ■ LCD process ■ Optical fiber process ■ General research use

Company information

川口液化ケミカル

川口液化ケミカル 川口事業所

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We provide equipment ranging from high-pressure gas (generally 15MPa: 150kg/cm²) to ultra-high vacuum regions (1x10⁻⁹Pa: 1x10⁻¹¹TORR), including both standard and custom products. Additionally, we can offer environments from high-temperature regions (2300°C) to ultra-low temperature regions (-270°C) as part of our equipment. Specifically, we can design and manufacture high-temperature vacuum heat treatment furnaces and vacuum low-temperature experimental devices upon consultation. Of course, we also provide utility piping for various equipment, as well as gases for the atmosphere and process gases. Please feel free to consult us with any inquiries.

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