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  6. Prototype Development Manual for Exposure Equipment

Prototype Development Manual for Exposure Equipment

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last updated:Feb 29, 2012

清和光学製作所
清和光学製作所
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Convenient manual aligners for research and development!!!

<Features> We provide a manual aligner with high precision and user-friendly design for research and development.

    Wafer processing/polishing equipmentOther semiconductor manufacturing equipmentOther surface treatment equipment
waferMEMS.WLCSP.gif

Prototype Development Manual for Exposure Equipment

waferMEMS.WLCSP.gif
waferMEMS.WLCSP.gif
  • Related Link - http://www.seiwaopt.co.jp/products/equip/exposure.…

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basic information

It supports 2-6 inches (also compatible with square substrates), with manual alignment and automatic Z-axis control, improving gap accuracy and making it a user-friendly device. It supports single-sided and double-sided alignment. It has a rich lineup, including options with a tabletop and vibration isolation table. For double-sided alignment, both side optical systems and IR optical systems are selectable.

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Research and development aligner

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清和光学製作所

清和光学製作所

Electronic Components and Semiconductors

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We will challenge the unknown world based on optics. The 21st century is said to be the "age of light," with remarkable advancements in optical technology. In our manufacturing company, we aim to accelerate future-oriented technological capabilities centered around "optical technology," actively tackling the information technology, ultra-fine technology, and scientific technology that the times require, and to be a dynamic company that acts swiftly. At the same time, we are committed to continuously promoting innovations suitable for the new century, striving to create safe and reliable products, and to remain a company that is needed by the world, actively working towards a richer society. We sincerely ask for your continued guidance and support.

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