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  6. Wafer exposure equipment (mask aligner) for research and development.

Wafer exposure equipment (mask aligner) for research and development.

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Wafer exposure device (mask aligner) for research and development.

last updated:Mar 16, 2021

清和光学製作所
清和光学製作所
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Manual type for research and development

Overview Capable of multi-purpose applications from research and development to small lot production Offers suggestions based on the intended use by selecting hard contacts, soft contacts, or proximity.

    Other semiconductor manufacturing equipment
1536127250-819545_06.jpg

Wafer exposure equipment (mask aligner) for research and development.

1536127250-819545_06.jpg
1536127250-819545_06.jpg
  • Related Link - https://www.seiwaopt.co.jp/product/?ca=28#15361272…

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basic information

Specifications Wafer: 12 inch, 6-8 inch, 4-6 inch, 2-4 inch Supports various sizes including square types Work transport: Manual Alignment: Manual alignment, auto alignment selectable Gap: Auto, manual selectable

Price range

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Delivery Time

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Applications/Examples of results

Research and development, small lot production of glass, wafers, films, ceramics, etc.

Company information

清和光学製作所

清和光学製作所

Electronic Components and Semiconductors

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We will challenge the unknown world based on optics. The 21st century is said to be the "age of light," with remarkable advancements in optical technology. In our manufacturing company, we aim to accelerate future-oriented technological capabilities centered around "optical technology," actively tackling the information technology, ultra-fine technology, and scientific technology that the times require, and to be a dynamic company that acts swiftly. At the same time, we are committed to continuously promoting innovations suitable for the new century, striving to create safe and reliable products, and to remain a company that is needed by the world, actively working towards a richer society. We sincerely ask for your continued guidance and support.

Product/Service List (46)

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