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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Other semiconductor manufacturing equipment
  6. Inline Frequency Adjustment Device "SFE-X2012"

Inline Frequency Adjustment Device "SFE-X2012"

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last updated:Dec 09, 2015

昭和真空
昭和真空
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Compact design, high precision, low price, high stability, high reproducibility.

The inline frequency adjustment device "SFE-X2012" separates the processing chamber from the extraction chamber and is equipped with ion sources for both high and low frequencies, enabling efficient operation with minimal idle time. It is equipped with two IGF-201 type 100mm beam ion sources, which were also used in the SFE-B03. Each ion source can process up to 24 units simultaneously, for a total of 48 units. The device adopts the high precision, high stability, and high reproducibility transport mechanism proven in the SFE-B03. Frequency adjustment for small workpieces (2.0×1.6, 1.6×1.2), which was previously difficult in inline processes, can now be stably mass-produced. Each unit allows for the disassembly of individual devices, designed with maintenance in mind. 【Device Performance】 ○ Tact Time: 0.3 sec/pc or less * For workpieces over 18MHz and more than 24 units in a row ○ Adjustment Accuracy: ±1.5 ppm or less ○ Processing Capacity: Up to 24 rows (p4.0) × 32 columns ○ Production Volume: Over 12,000 pcs/hour For more details, please contact us or download the catalog.

    Other semiconductor manufacturing equipment
14_x2012.jpg

Inline Frequency Adjustment Device "SFE-X2012"

14_x2012.jpg
14_x2012.jpg
  • Related Link - http://www.showashinku.co.jp/index.html

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basic information

【Specifications】 ○ Work Size: Compatible with small sizes of SMD 2016 and below ○ Equipment Configuration: 3 chambers (Loading Chamber, Processing Chamber, Unloading Chamber) Inline type  ※ Optionally available with LD loader (includes O Over and D Drive), can dock with ULD ○ Transport System: X-axis transport using H/L, same as SFE-B03 type ○ Exhaust System: Processing Chamber 12-inch CP, Loading/Unloading Chambers RP + MBP ○ Ion Source: 100mm beam rectangular type × 2 units             ⇒ Maximum of 48 simultaneous processing ○ Measuring Instruments: 4 Network Analyzers ○ PC: 2 Windows PCs, 2 DOS PCs ○ Surrounding Adjustment Process: 2 stages (H, LL) ● For more details, please contact us or download the catalog.

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Crystal device frequency adjustment ● For more details, please contact us or download the catalog.

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昭和真空

昭和真空

Industrial Machinery

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Showa Vacuum Co., Ltd. manufactures and sells vacuum technology application devices (vacuum equipment) such as vacuum deposition devices and sputtering devices, primarily focused on equipment that forms thin films on specific substrates in a vacuum.

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