You can achieve improved production efficiency and reduced cycle time.
The high vacuum annealing device "SAF-52T-II" is developed for the purpose of removing internal stress distortions that occur during the processing of quartz oscillators and for thermal treatment to stabilize electrode films. It features a heating shelf measuring W460×D350×H35mm with a total of 10 independent processing chambers, capable of holding up to 60 standard trays measuring 170×134mm. 【Features】 ○ Equipped with two independently operable processing chambers ○ Enhances production efficiency and reduces cycle time ○ Efficient cycle time and labor-saving through full automation For more details, please contact us or download the catalog.
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basic information
【Specifications】 [Dimensions and Weight] ○ External dimensions: W1700mm × D900mm × H1700mm ○ Equipment weight: Approximately 1200kg [Required Specifications] ○ Required power: 3-phase, 200V, 22.4KVA (64.7A) ○ Required water: Inlet pressure: 0.3–0.4MPa, Differential pressure: 0.2MPa or more Water temperature: 20–25℃ (no condensation during operation) Flow rate: Approximately 0.66m3/hr (11L/min) ○ Required air pressure: Supply pressure: 0.5–0.7MPa, Set pressure: 0.5MPa ○ Required gas (for N2 gas leak): Supply pressure: 0.2MPa or more Set pressure: 0.05–0.1MPa [Performance] ○ Achievable pressure: Below 6.7×10-4Pa (2-chamber exhaust) ○ Exhaust time: 20 minutes to 6.7×10-3Pa (2-chamber exhaust) ○ Maximum temperature: 300℃ (Surface temperature at the center of the sample tray) ○ Operating temperature: 250℃ (Surface temperature at the center of the sample tray) ○ Temperature adjustment accuracy: Within ±15℃ (at 250℃, surface temperature at the center of the sample tray) ● For more details, please contact us or download the catalog.
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Crystal Device ●For more details, please contact us or download the catalog.
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Company information
Showa Vacuum Co., Ltd. manufactures and sells vacuum technology application devices (vacuum equipment) such as vacuum deposition devices and sputtering devices, primarily focused on equipment that forms thin films on specific substrates in a vacuum.
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