Film thickness distribution: Achieved ±1.2% within the tray and ±1.5% between trays.
Showa Vacuum has fully revamped its bestselling device, the SPH-2500, which boasts approximately 15 years of proven performance. The load-lock type sputtering device "SPH-2500-II" inherits the features of the previous model while incorporating the latest technology, achieving performance that surpasses the conventional model in every aspect. 【Features】 ○ Dimensions: W1200×D2500×H1440, maintaining the same footprint while significantly reducing height ○ By improving the cathode, target usage efficiency has been greatly increased to 44% ○ Adopting a rack and pinion system eliminates transport issues caused by roller slippage For more details, please contact us or download the catalog.
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basic information
【Device Configuration】 ○Device Size: W2500×D1200×H1440 ○Configuration: Stocker + Loading Chamber + SP Chamber Intervac Type ○Sputtering Method: DC Magnetron ○Cathode: 5 inches × 7 inches, 2 pairs (1 pair with high usage efficiency cathode) ○DC Power Supply: 800V, 3.75A (MAX 1.5kW) ○Tray Size: L350mm × H210mm ○Substrate Transport Method: Rack & Pinion Transport ○Stocker: Holds 10 trays ○Exhaust System: 2 Turbo Molecular Pumps / 2 Oil Rotary Pumps 【Performance】 ○Film Thickness Distribution: Within tray ±1.2%, Between trays ±1.5% ○Target Usage Efficiency: 44% (maximum) ○Cycle Time: 3 minutes/cycle (excluding the first sheet) ○Achievable Pressure: Loading Chamber 1.0×10^-3Pa or lower, SP Chamber 1.0×10^-3Pa or lower ○Exhaust Time: Loading Chamber up to 2.0×10^-2Pa within 3 minutes, SP Chamber up to 1.2×10^-2Pa within 10 minutes ○Substrate Heating Temperature: Confirmed above 150℃ ●For more details, please contact us or download the catalog.
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Applications/Examples of results
【Purpose】 ○ For the formation of electrode films and protective films on small electronic components ● For more details, please contact us or download the catalog.
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Company information
Showa Vacuum Co., Ltd. manufactures and sells vacuum technology application devices (vacuum equipment) such as vacuum deposition devices and sputtering devices, primarily focused on equipment that forms thin films on specific substrates in a vacuum.
