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  5. Resist Device
  6. Liftoff (Image Reversal) Compatible Photoresist Development Equipment

Liftoff (Image Reversal) Compatible Photoresist Development Equipment

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last updated:Mar 21, 2024

エイ・エス・エイ・ピイ
エイ・エス・エイ・ピイ
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Proven results with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.

The product is equipped with sheet-type development, front exposure (reverse exposure), baking, and cooling functions. We offer a lineup tailored to production volume, ranging from manual machines to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we have achieved low prices. We have a proven track record with a variety of chemicals, including TMAH. 【Features】 ■ Achieves low prices ■ Automatic size recognition ■ Proven track record with a variety of chemicals ■ Reduced footprint ■ Lineup tailored to production volume *For more details, please refer to the PDF document or feel free to contact us.

    Resist Device
IMG_5942.JPG

Liftoff (Image Reversal) Compatible Photoresist Development Equipment

IMG_5942.JPG
IMG_5942.JPG
  • Related Link - http://www.asap-semi.co.jp/coaters/

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**Main Specifications** - Cassette Stage: 2 sets - Spin Development Unit: 2 sets - Wafer Size: Φ2" to Φ12" - Development Nozzle: 1 set/CUP - Rinse Nozzle: 1 set/CUP - Bake Unit: 2 sets (Max 200℃) - Cooling Unit: 1 set - Centering Unit: 1 set - UV Exposure Unit (LED light source is also available) - Equipment Size: (Example) 1200×1000×1800 (Φ4" main body) 1600×2500×1800 (Φ12" main body) - Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please refer to the PDF document or feel free to contact us.*

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エイ・エス・エイ・ピイ

エイ・エス・エイ・ピイ

Electronic Components and Semiconductors

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We specialize in the design, manufacturing, and sales of photoresist coating, exposure, and development equipment, as well as photolithography processes in general, including double-sided exposure devices. In particular, we possess high uniformity coating technology for substrates with uneven surfaces or V-grooves, as well as for square and irregularly shaped substrates. Furthermore, we have developed and are selling a peeling and lift-off device that prevents the occurrence of burrs and metal reattachment using high-pressure jet NMP. Additionally, we handle various coating devices such as polyimide, PBF, OCD, WAX, high-temperature baking devices, and spin dryer devices. We customize equipment according to customer specifications and budgets. We also sell various wafers and substrates.

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