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  6. Thin Film Experimental Device - "PRODUCTS GUIDE 2022"

Thin Film Experimental Device - "PRODUCTS GUIDE 2022"

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Thermo Fisher Japan Product Guide 2020

last updated:Aug 13, 2026

テルモセラ・ジャパン 本社
テルモセラ・ジャパン 本社
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Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.

Introducing various thin film experimental devices and components for research and development fields. 【nano Benchtop Series】 High performance! nano Benchtop series thin film experimental devices Compact size housing high-functionality and high-spec thin film equipment. 【MiniLab Flexible Thin Film Experimental Device】 A "flexible experimental device" that combines various device configurations and necessary components according to required specifications.

    Sputtering EquipmentAnnealing furnaceEvaporation Equipment
Products

Thin Film Experimental Device - "PRODUCTS GUIDE 2022"

Products guide_Deposition.png
Products guide_Deposition.png
  • Related Link - https://www.thermocera.com/
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◉ Nano Benchtop Series Thin Film Experimental Equipment - nanoPVD-S10A Magnetron Sputtering Device - nanoPVD-T15A Organic and Metal Film Deposition Device - nanoCVD Graphene Synthesis Device - ANNEAL Wafer Annealing Device - MiniLab Series Flexible Thin Film Experimental Equipment - MiniLab-GB Glove Box Type Thin Film Experimental Equipment - Other components *For more details, please inquire through a request for materials or download.

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Applications/Examples of results

Research and development of electronic devices, fuel cells, displays, etc. Research and development for the bio, medical, and chemical industries.

catalog(35)

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Thin Film Experiment Device - "PRODUCTS GUIDE 2024"

Thin Film Experiment Device - "PRODUCTS GUIDE 2024"

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[nanoPVD-S10A] RF/DC Magnetron Sputtering Device

[nanoPVD-S10A] RF/DC Magnetron Sputtering Device

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◆nanoPVD-T15A◆ High-performance organic and metal film deposition device

◆nanoPVD-T15A◆ High-performance organic and metal film deposition device

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MiniLab Series Flexible Thin Film Experimental Device

MiniLab Series Flexible Thin Film Experimental Device

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MiniLab-026 Flexible Thin Film Experimental Device

MiniLab-026 Flexible Thin Film Experimental Device

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★【MiniLab-060】Flexible Thin Film Experimental Device★

★【MiniLab-060】Flexible Thin Film Experimental Device★

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★【MiniLab-080】Flexible Thin Film Experimental Device★

★【MiniLab-080】Flexible Thin Film Experimental Device★

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★【MiniLab-090】Flexible Thin Film Experimental Device★

★【MiniLab-090】Flexible Thin Film Experimental Device★

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MiniLab-026/090 Glove Box Thin Film Experiment Device

MiniLab-026/090 Glove Box Thin Film Experiment Device

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◆HTE Heater/OLED Organic Vapor Deposition・High-Temperature Metal Vapor Deposition Cell◆ Max 1500℃

◆HTE Heater/OLED Organic Vapor Deposition・High-Temperature Metal Vapor Deposition Cell◆ Max 1500℃

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Magnetron Sputtering Cathode

Magnetron Sputtering Cathode

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[nanoCVD-8G/8N] Graphene/CNT synthesis device

[nanoCVD-8G/8N] Graphene/CNT synthesis device

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◆ANNEAL◆ Wafer Annealing Equipment

◆ANNEAL◆ Wafer Annealing Equipment

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【Nanofurnace】Model. BWS-NANO Thermal CVD Device

【Nanofurnace】Model. BWS-NANO Thermal CVD Device

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Experimental Furnace/Heater "PRODUCTS GUIDE 2024"

Experimental Furnace/Heater "PRODUCTS GUIDE 2024"

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【Mini-BENCH】Ultra-high temperature tabletop experimental furnace Max 2000℃

【Mini-BENCH】Ultra-high temperature tabletop experimental furnace Max 2000℃

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Mini-BENCH-prism Semi-Automatic Ultra-High Temperature Experimental Furnace Max 2000℃

Mini-BENCH-prism Semi-Automatic Ultra-High Temperature Experimental Furnace Max 2000℃

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MiniLab-WCF Ultra High Temperature Wafer Annealing Furnace Max 2000℃

MiniLab-WCF Ultra High Temperature Wafer Annealing Furnace Max 2000℃

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BH Series [High-Temperature Thin Film Experiment Substrate Heating Heater] Max 1800℃

BH Series [High-Temperature Thin Film Experiment Substrate Heating Heater] Max 1800℃

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[SH High-Temperature Substrate Heating Heater] (Inc/BN Plate Max 1100℃) High-Temperature Plate Heater for PVD CVD Vacuum Thin Film

[SH High-Temperature Substrate Heating Heater] (Inc/BN Plate Max 1100℃) High-Temperature Plate Heater for PVD CVD Vacuum Thin Film

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Hot Stage [Substrate Heating Mechanism] Ultra-High Temperature Substrate Heating Heater

Hot Stage [Substrate Heating Mechanism] Ultra-High Temperature Substrate Heating Heater

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【PyroUSB】USB-connected high-precision infrared temperature sensor

【PyroUSB】USB-connected high-precision infrared temperature sensor

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PyroMini USB - USB-connected small infrared temperature sensor

PyroMini USB - USB-connected small infrared temperature sensor

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PyroMini Compact High-Performance Infrared Temperature Sensor

PyroMini Compact High-Performance Infrared Temperature Sensor

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【PyroNFC】Smartphone-configured infrared radiation temperature sensor

【PyroNFC】Smartphone-configured infrared radiation temperature sensor

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PyroCouple Infrared Temperature Sensor

PyroCouple Infrared Temperature Sensor

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ExTemp intrinsic safety explosion-proof infrared radiation temperature sensor

ExTemp intrinsic safety explosion-proof infrared radiation temperature sensor

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★nano BenchTop Series Thin Film Experiment Device★

★nano BenchTop Series Thin Film Experiment Device★

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Multifunctional Multi-Sputtering Device [MiniLab-S125A] Compatible with Φ8"

Multifunctional Multi-Sputtering Device [MiniLab-S125A] Compatible with Φ8"

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Multi-functional Sputtering Device 【MiniLab-S060】

Multi-functional Sputtering Device 【MiniLab-S060】

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【MiniLab】 Evaporation/Sputtering Dual Chamber System

【MiniLab】 Evaporation/Sputtering Dual Chamber System

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Glove Box Thin Film Experimental Device [MiniLab-026/090-GB]

Glove Box Thin Film Experimental Device [MiniLab-026/090-GB]

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Wafer Scale Graphene Synthesis Device [nanoCVD-WGP]

Wafer Scale Graphene Synthesis Device [nanoCVD-WGP]

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Soft Etching Device [nanoETCH] < Damage-free etching with 30W low power control

Soft Etching Device [nanoETCH] < Damage-free etching with 30W low power control

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Sputtering and deposition source mixed composite film formation device [nanoPVD-ST15A]

Sputtering and deposition source mixed composite film formation device [nanoPVD-ST15A]

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【PyroMini】Small High-Performance Infrared Temperature Sensor Image

■□【PyroMini】□■ Compact High-Performance Infrared Temperature Sensor

  • Product news

High-performance touch panel converter for easy setup, data logging, and data storage on microSD card. The PM2.2 model can also measure glossy metal surfaces. 【Overview】 With a highly visible high-brightness touch panel display, parameters such as temperature range, emissivity, and sampling rate can be intuitively operated and set. Long-term data storage and management are possible with a microSD card. (*An option for a converter without a display is also available.) The compact sensor head, measuring φ18mm x 45mm, allows for temperature measurement in tight spaces. It employs sensors and cables with excellent noise resistance, making it suitable for integration into moving equipment such as robotic arms. The PM2.2 model uses a short wavelength of 2.2um, supporting high temperatures (Max 2000℃) and measurements of glossy metal material surfaces. 【Features】 ◎ Wide range: -20 to 1000℃ (PM), 100 to 2000℃ (PM2.2) ◎ Excellent basic performance: Accuracy ±1%, reproducibility ±0.5%, 240msec fast response ◎ Measurement wavelength range: 8 to 14μm (PM), 2.0 to 2.2μm (PM2.2) ◎ Compact Φ18mm x 45mm

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PyroUSB high-precision infrared temperature sensor image

■□【PyroUSB】□■ USB-connected high-precision infrared temperature sensor

  • Product news

【Overview】 Connect to a Windows PC using the standard accessory "CalexConfig" and the included USB cable (1.8m), allowing you to set measurement parameters for the sensor, analyze measurement results, and output them in CSV format. 1) 4-20mA output 2) USB output (operates on USB bus power) 3) Simultaneous use of 4-20mA/USB output These three methods of use are possible. 【Features】 ◎ Simultaneous use of USB data logging and 4-20mA analog output ◎ Excellent basic performance: accuracy ±1%, reproducibility ±0.5%, 200msec fast response ◉ PUA2: Covers short wavelengths from 2.0 to 2.4μm, capable of measuring metal surfaces ◉ PUA5: Optimal for measuring glass surfaces, wavelength 5μm ◉ PUA8: General-purpose, suitable for a wide range of applications, wavelength 8-14μm 【Other Specifications】 ◉ Field of view: 15:1, 25:1, 30:1, or 75:1 ◉ Emissivity setting range: 0.1 to 1.0 ◉ Power supply: 24VDC ◉ Body dimensions: Φ27.6mm (diameter) x 61mm (length) ◉ Weight: approximately 155g ◉ Analog signal cable 1m (standard included, extendable up to 30m) *USB cable 1.8m (USB cable cannot be extended)

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HTE heater / OLED organic deposition and high-temperature metal evaporation source

◆OLED◆ Organic vapor deposition - High-temperature metal evaporation source Max 1500℃

  • Product news

The OLED evaporation source is a high-temperature heating heater for vacuum devices with a maximum operating temperature of 1500°C. It can evaporate materials with high evaporation temperatures, making it suitable for a wide range of applications as a vacuum high-temperature heater and evaporation cell, from low-temperature organic deposition (up to 800°C) cells to high-temperature resistance heating deposition (up to 1500°C) MBE cells. Shutter actuators and water-cooled jackets are also available. High-temperature heaters above 800°C are designed with internal shielding, considering insulation and thermal shielding. 【Main Specifications】 ■ Maximum control temperature: 800°C or 1500°C ■ Operating environment: in vacuum or inert gas (*O2 up to 800°C) ■ Heater: tungsten filament ■ Crucible volume: 1cc (maximum fill volume 1.5cc) ■ Crucible material: alumina ■ Case material: SUS304 or molybdenum ■ Thermocouple: K or C 【Options】 ⚫ Crucible material: PBN, graphite, quartz ⚫ Heater: NiCr wire, Kanthal wire (*for O2) ⚫ Crucible volume: 10cc (maximum fill volume 15cc) ⚫ Shutter: pneumatic or motor-driven ⚫ Water-cooled jacket ⚫ Controller (for heater and shutter control)

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[SH Vacuum Substrate Additional High-Temperature Plate Heater_Max 1100℃] For CVD and PVD Vacuum Thin Films

  • Catalog news

ThermoCera Japan has updated the latest catalog for its ultra-high temperature substrate heating heaters, suitable for thin film experiments such as CVD and PVD, ranging from 1 inch to 4 inches. ◉ Maximum operating temperature: 850°C (SH-IN), 1100°C (SH-BN) We also accommodate requests for customized products such as substrate holders, vertical lift mechanisms, substrate rotation mechanisms, and RF bias. Additionally, we offer heater controllers in both traditional standalone models and 19-inch rack mount options.

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テルモセラ・ジャパン

テルモセラ・ジャパン 本社

Industrial Electrical Equipment

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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.

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テルモセラ・ジャパン 本社

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