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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Sputtering Equipment
  6. Multilayer film sputtering device 'S600'

Multilayer film sputtering device 'S600'

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last updated:Jul 31, 2023

パナソニック プロダクションエンジニアリング
パナソニック プロダクションエンジニアリング
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Equipped with a heater stage (1000°C)! Usable for various applications from the development process to mass production.

The S600 is a multilayer sputtering device that contributes to the enhancement of electronic component quality and productivity through improvements in multilayer and stacked film deposition processes. By achieving high-quality and high-precision film deposition, it enhances device quality. It increases cost competitiveness through high throughput, improved production yield, and optimized material utilization efficiency. With options that accommodate various deposition conditions, it is capable of supporting small-batch production of diverse products and flexible production planning. 【Features】 - Equipped with up to 5 cathodes to achieve diverse processes and high productivity - Maintains long-term uniformity of film thickness through T/S distance adjustment - Improves sputtered thin film characteristics with unique plasma control (MP sputtering) technology - Capable of high-temperature processes with a heater stage (up to 1000°C) - Usable for various applications from development processes to mass production *For more details, please refer to the PDF document or feel free to contact us.

    Sputtering Equipment
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Multilayer film sputtering device 'S600'

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  • Related Link - https://www.panasonic.com/jp/company/ppe/jigyo/pro…

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【Other Features】 ■ Achieves high productivity with a double load lock chamber ■ Combines rotary type and multi-chamber type for a transport form that balances responsiveness to various processes and high throughput ■ Various units can be mounted in each position ■ Supports processing of 3 to 6-inch substrates (also compatible with mixed production of various types) ■ Achieves high precision film thickness uniformity and long target lifespan with large diameter wide erosion using an eccentric rotating magnet ■ Magnetic field design is simulated and designed by our company to meet customer requests to the fullest extent *For more details, please refer to the PDF document or feel free to contact us.

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Multilayer film sputtering device 'S600'

Multilayer film sputtering device 'S600'

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パナソニック

パナソニック プロダクションエンジニアリング

Industrial Machinery

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In the manufacturing field, due to a shortage of personnel, there is a demand for automation along with improvements in productivity and efficiency, as well as a wide range of responses such as quality enhancement and environmental initiatives. However, the reality is that existing systems, which have been customized and complicated, hinder efficiency and digital transformation, resulting in slow progress in these efforts. Panasonic Production Engineering will address these various challenges with the technical expertise and proposal capabilities cultivated over many years.

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