Equipped with three sources of cathodes in a compact tabletop size. It is also possible to produce insulating thin films, oxide, and nitride thin films.
The "SVC-700RFIII" is a compact RF magnetron sputtering device that can be placed on a desk, equipped with three φ2-inch cathodes. It is capable of forming stacked films using three types of targets. It can be expanded with a gas introduction mechanism, allowing for the introduction of up to three types of gases, including argon gas. In addition to metal thin films, it can accommodate the production of various thin films such as insulating films, oxides, and nitrides. 【Features】 ■ Desktop size for research and development ■ Sample size: up to φ2 inches ■ Additional film thickness sensor available *For more details, please refer to the documentation. Feel free to contact us with any inquiries.
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【Product Specifications】 Sputtering Method: RF Magnetron Sputtering Cathode: φ2 inch × 3 sources / Water-cooled Sputter Up Sputtering Power Supply: RF Power Supply 13.56MHz Max. 200W (with manual matching unit) Achievable Vacuum Level: 10^-4 Pa range Dimensions: SVC-700RFIII (Control Unit): W370×D310×H195mm RF CONTROL UNIT: W370×D310×H158mm Chamber Unit: W370×D540×H400mm Required Power Supply: AC100V 50/60Hz 15A 1 circuit 3-pin plug *For more details, please refer to the documentation. Feel free to contact us with any inquiries.
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P6
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The management philosophy is to "pioneer the future of research and development with core technology." Our motto is to provide those involved in research and development with what they need at the right time, while enhancing the "expandability of device functions" and offering a "variety of options." Additionally, leveraging our "agility," we strive daily to meet the diverse needs of our customers.