Pressure-based mass flow controller "GP200 series"

We explain the operating principle of the GP200 series metal seal type pressure-based mass flow meter (P-MFC) in a video. (English) https://www.youtube.com/watch?v=ZWB03A_9fo8 Video Chapters 00:00 - What is Brooks Instrument? 01:00 - What is a conventional pressure-based MFC? 02:10 - Introduction to the GP200 pressure-based MFC 03:30 - Advantages of the GP200 MFC 03:50 - Pressure measurement method of the GP200 MFC 04:45 - Superiority of the GP200 This pressure-based mass flow meter adopts a unique design that overcomes the limitations of conventional pressure-based MFCs and significantly improves process performance.

The GP200 series is the first fully pressure-independent PMFC designed specifically for semiconductor applications. With GP200's unique differential pressure technology and state-of-the-art sensor and valve configuration, it eliminates the limitations of traditional pressure-based mass flow controllers, enabling the most extensive and accurate process gas control in the industry. Brooks developed the world's first MFC that allows for the reconfiguration of gas types and flow ranges, and has continued to refresh gas models since its release, with the same functionality incorporated into the GP200. It allows for easy reconfiguration for many gas types and a wide range of flow rates, providing flexible support for a variety of processes. The ultra-fast and highly reproducible valve control of the GP200, along with its resistance to pressure fluctuations, maintains precise flow control to the chamber even in cases of extreme supply pressure variations, enabling tighter process control. The GP200 platform supports a wide range of process conditions and can replace or upgrade many traditional pressure-based mass flow controllers.

Realizing Precision Control in Energy Innovation Hydrogen, fuel cells, CCUS, biofuels, CNT manufacturing. There are technologies on-site that monitor precise flows to support the energy of the future. Brooks Instrument's flow meters support the energy transition.

"Maximizing the Best Performance" This is the industry's first fully pressure-insensitive type of pressure-based mass flow controller (P-MFC) specifically designed for advanced etching and deposition processes in semiconductor manufacturing. The GP200 series P-MFC adopts a patented architecture that overcomes the limitations of conventional P-MFCs, enabling high-precision process gas supply even with low vapor pressure process gases. It also features a built-in differential pressure sensor and a unique design that places the valve downstream, allowing for high-precision process gas supply across the widest range of operating conditions in the industry. Due to its compatibility with a wide range of process conditions, it can be used as a replacement or upgrade for conventional P-MFCs and thermal MFCs. Additionally, by eliminating the need for components such as pressure regulators and converters, it simplifies the gas supply system and reduces costs. [Main Applications] ■ Semiconductor Manufacturing ■ Etching ■ CVD ■ Gas flow control applications requiring high-purity all-metal flow paths