Many safety measures specifications necessary for mass production! Compact device size with a film formation temperature of 50 to 285°C.
The "Phoenix G2" is a thermal ALD system suitable for medium-scale production. It features a reactor design proven to provide excellent process flexibility, making it easy to use for various applications. Additionally, it supports semi-auto loaders or vacuum load locks and has an appropriate chamber size (less than 370mm x 470mm). 【Features】 ■ Reactor design proven to provide excellent process flexibility ■ Easy to use for various applications ■ Many safety measures required for mass production ■ Compatible with semi-auto loaders or vacuum load locks ■ Appropriate chamber size: less than 370mm x 470mm *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■Compact device size: 900mm × 1370mm × 1700mm (excluding loader and load lock) ■Simple decontamination unit: Equipped with ALD Shield Vapor Trap ■Film deposition temperature: 50 to 285℃ *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company website features information on used equipment related to FPD and semiconductors. ● Main Business Activities Purchase of used semiconductor manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for semiconductor manufacturing lines Purchase of used FPD manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for FPD manufacturing lines Contract development, manufacturing, and sales of semiconductor manufacturing equipment and FPD manufacturing equipment Sales of various equipment parts Agency sales of overseas manufactured equipment
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