Many safety measures specifications necessary for mass production! Compact device size with a film formation temperature of 50 to 285°C.
The "Phoenix G2" is a thermal ALD system suitable for medium-scale production. It features a reactor design proven to provide excellent process flexibility, making it easy to use for various applications. Additionally, it supports semi-auto loaders or vacuum load locks and has an appropriate chamber size (less than 370mm x 470mm). 【Features】 ■ Reactor design proven to provide excellent process flexibility ■ Easy to use for various applications ■ Many safety measures required for mass production ■ Compatible with semi-auto loaders or vacuum load locks ■ Appropriate chamber size: less than 370mm x 470mm *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■Compact device size: 900mm × 1370mm × 1700mm (excluding loader and load lock) ■Simple decontamination unit: Equipped with ALD Shield Vapor Trap ■Film deposition temperature: 50 to 285℃ *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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