Rapid cooling mechanism after annealing! Introducing the high-speed heat treatment equipment from Annealsys.
The "AS-One 100/150" is an RTP device compatible with atmospheric and vacuum processes. It can be equipped with a turbo pump, and the mass flow controller can be up to 5. Please feel free to consult us when you need assistance. 【Features】 ■ Rapid cooling mechanism after annealing ■ Compatible with atmospheric and vacuum processes ■ Turbo pump can be installed ■ Mass flow controller: up to 5 *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications】 ■AS-One 100 - Supports substrates up to 100mm in diameter - Maximum temperature: 1450℃ (lamp heating type from above the substrate) - Maximum heating rate: 200℃/second - Low temperature (1100℃) / high temperature (1450℃) pyrometer ■AS-One 150 - Supports substrates up to 150mm in diameter - Maximum temperature: 1300℃ (lamp heating type from above the substrate) - Maximum heating rate: 150℃/second - Low temperature (1100℃) / high temperature (1450℃) pyrometer *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company website features information on used equipment related to FPD and semiconductors. ● Main Business Activities Purchase of used semiconductor manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for semiconductor manufacturing lines Purchase of used FPD manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for FPD manufacturing lines Contract development, manufacturing, and sales of semiconductor manufacturing equipment and FPD manufacturing equipment Sales of various equipment parts Agency sales of overseas manufactured equipment
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