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  1. Home
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  3. Scientific and Physics Equipment
  4. Heating equipment/furnace
  5. Heating device
  6. Various wafer high-speed heating treatment device "HEATPULSE"

Various wafer high-speed heating treatment device "HEATPULSE"

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last updated:Mar 13, 2024

プラズマ・サーモ・ジャパン
プラズマ・サーモ・ジャパン
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High throughput SiC wafer annealing with 'no susceptor'! Compatible with 4-8 inch wafers.

The "HEATPULSE" is a high-speed heating treatment (RTP/RTA) device capable of SiC wafer annealing without the need for a susceptor. Thanks to our unique technology, high-temperature processes are also made more efficient. This device is suitable for power device-related applications, as well as other semiconductor industries, or for those requiring high-temperature rapid heating treatment. 【Features】 ■ Achieves SiC annealing without a susceptor through unique technology ■ Approximately 1.5 times higher throughput and improved process flexibility due to enhanced purge efficiency and heating rate (compared to our susceptor-equipped devices) ■ The new model supports a two-chamber configuration, allowing for future upgrades from single to double chamber ■ Plasma-Therm's proprietary user-friendly control system "Cortex" *For more details, please refer to the related links or feel free to contact us.

    Heating device
HEATPULSE.PNG

Various wafer high-speed heating treatment device "HEATPULSE"

HEATPULSE.PNG
HEATPULSE.PNG
  • Related Link - https://www.plasmatherm.com/product/heatpulse-rtp/

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basic information

【Specifications】 ■Compatible with 4-8 inch wafers ■Direct measurement of substrate temperature using DTC (Direct Thermocouple) ■Dual chamber (supports up to 2 chambers, 2 cooling stations, and 2 cassettes) ■Automatic 3-axis aligner ■Footprint 80" × 52" (203 cm × 132 cm) *For more details, please refer to the related links or feel free to contact us.

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Applications/Examples of results

【Applications】 ■Supports RTP (Rapid Thermal Processing) in the thermal treatment process of SiC wafers ■Heating treatment of Si, SiC, Sapphire, and GaAs wafers *For more details, please refer to the related links or feel free to contact us.

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プラズマ・サーモ・ジャパン

プラズマ・サーモ・ジャパン

Electronic Components and Semiconductors

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Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for over 50 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en

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