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  6. Notice of Participation in "Semicon Japan 2024" and Seminar Hosting

Notice of Participation in "Semicon Japan 2024" and Seminar Hosting

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last updated:Nov 28, 2024

プラズマ・サーモ・ジャパン
プラズマ・サーモ・ジャパン
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At the seminar, we plan to introduce new technologies such as HDRF-high-density radicals for low-temperature removal of polymers and HDI resists.

Plasma Thermo Japan Co., Ltd. will be exhibiting at "Semicon Japan 2024" held at Tokyo Big Sight. Our company specializes in plasma technology, handling etching, deposition, cleaning equipment, ALD-like deposition equipment, ion beam equipment, PVD equipment, and RTP equipment. We also offer batch-type sputtering equipment and electron beam evaporation equipment, enabling us to propose solutions for various applications. In the seminar held at our booth, we plan to introduce new technologies that enable low-temperature removal of polymers and HDI resist using HDRF-high-density radicals, as well as new technologies for ALD-like deposition with the deposition rate of KBOUS FAST-CVD. We look forward to your visit. 【Event Overview】 ■ Dates: December 11 (Wed) - 13 (Fri), 2024, 10:00 - 17:00 ■ Venue: Tokyo Big Sight, East Hall 4, Booth 4032 ■ Address: 3-11-1 Ariake, Koto-ku, Tokyo 135-0063 ■ Nearest Stations: - Rinkai Line, Kokusai-Tenjijo Station (approximately 7 minutes on foot) - Yurikamome, Tokyo Big Sight Station (approximately 3 minutes on foot) *For more details, please refer to the related links or feel free to contact us.

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Notice of Participation in "Semicon Japan 2024" and Seminar Hosting

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  • Related Link - https://www.semiconjapan.org/jp

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【Seminar Overview】 ■December 11 ・10:30–10:50 HRDF ・14:00–14:20 KOBUS FAST ■December 12 ・10:30–10:50 KOBUS FAST ・14:00–14:20 HRDF ■December 13 ・10:30–10:50 HDRF ・14:00–14:20 KOBUS FAST *For more details, please refer to the related links or feel free to contact us.

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Formation of conformal transparent conductive film for LEDs using KOBUS FAST.

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French-designed and manufactured equipment: ICP-CVD film deposition system.

French-designed and manufactured equipment: ICP-CVD film deposition system.

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French-designed and manufactured equipment: ICP etching equipment.

French-designed and manufactured equipment: ICP etching equipment.

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Tabletop Type Etching and Film Deposition Device 'Plasma POD Series'

Tabletop Type Etching and Film Deposition Device 'Plasma POD Series'

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Plasma Removal Device "HDRF"

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Cryo Plasma Etching Takachi ICP

Cryo Plasma Etching Takachi ICP

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English version: Defective analysis etching equipment '200FA/200R/200I'

English version: Defective analysis etching equipment '200FA/200R/200I'

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Corial 200 Series Film Formation Device

Corial 200 Series Film Formation Device

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Ion Beam Etching and Deposition Equipment 'QuaZar(TM)'

Ion Beam Etching and Deposition Equipment 'QuaZar(TM)'

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Company information

プラズマ・サーモ・ジャパン

プラズマ・サーモ・ジャパン

Electronic Components and Semiconductors

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Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en

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