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  6. Small developing device for photolithography

Small developing device for photolithography

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AD-1200

last updated:Oct 01, 2010

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Small developing device for photolithography

Swing nozzle type spray development and paddle development compatible device 【Features】 - High performance, low price, compact tabletop type - Work size Φ1" to Φ6" - Easy operation with program input via LCD touch panel - Built-in dual liquid pressure delivery pumps ◆ For detailed specifications, refer to the catalog ◆

    Etching Equipment
現像装置、AD-1200-1.jpg

Small developing device for photolithography

現像装置、AD-1200-1.jpg
現像装置、AD-1200-1.jpg

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Swing nozzle type spray development and paddle development compatible device 【Features】 - High performance, low price, compact tabletop type - Work size Φ1" to Φ6" - Easy operation with program input via LCD touch panel - Built-in dual liquid pressure delivery pumps ◆ For detailed specifications, refer to the catalog ◆

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Developing device, AD-1200

Developing device, AD-1200

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Electronic Components and Semiconductors

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We design, manufacture, and sell various types of equipment for both testing and research purposes as well as production automatic devices, including various front-end (photoresist-related) devices and manual spin coaters (for Si, LCD glass, compounds, etc.). [Testing and Research Development, Production Related Equipment for Semiconductors and LCDs] Various cleaning machines (wet, dry), spin coaters, mask aligners, developing and etching equipment, various vacuum devices, probers, and drillers for film thickness measurement, etc.

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